Pin Lifting System Radial Support for Electrostatic Chuck Protection
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Solution Overview
Problem
Conventional pin lifting systems in wafer processing systems cause damage to electrostatic chucks due to lateral displacement, leading to inefficient operation and costly repairs.
Innovation Solution
A pin lifting system with a radial force providing device and varying distances between bearings to minimize lateral displacement, utilizing a pin retaining spring and geometric centering to reduce contact with the electrostatic chuck.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the lifting pin is moved closer to the semiconductor wafer, then the lifting effectiveness is improved, but the risk of contacting and damaging the electrostatic chuck increases
Solution Approach 1:
A radial force providing device is introduced as an intermediary component between the lifting pin and the electrostatic chuck. This device provides radial support to the lifting pin, preventing lateral displacement and contact with the electrostatic chuck surface, while allowing the pin to move vertically for effective lifting.
Solution Approach 2:
The distance between the lifting pin and the electrostatic chuck surface is optimized to a specific range. The pin is positioned close enough to the wafer for effective lifting but maintained at a safe distance from the electrostatic chuck surface through the radial support mechanism, changing the spatial parameter to resolve the contradiction.
2Ease of operation
If the lifting pin is allowed to move freely, then the ease of operation is improved, but the lateral displacement increases causing contact with the electrostatic chuck
Solution Approach 1:
The radial force providing device acts as a guiding intermediary that constrains the lifting pin's movement. It allows vertical movement for lifting operation while preventing lateral displacement, thus maintaining both ease of operation and positioning precision.
Solution Approach 2:
The system transitions from a static fixed-position pin to a dynamically supported pin that can move vertically while being radially constrained. The radial force providing device enables this dynamic movement pattern, allowing operational freedom within precise boundaries.
Data Source
AI summary
An aspect of the present invention is drawn to a device for use with an electrostatic chuck having a top surface and a bottom surface, the top surface being separated from the bottom surface by a width, the electrostatic chuck additionally having a hole therein, the hole having a first width at the top surface and having a second width at the bottom surface, the first width being less than the second width, the top surface being capable of having wafer disposed thereon. The device includes a pin, a shaft, a neck portion and an outer housing portion. The pin has a pin width less than the first width. The shaft has a pin-holding portion, an end portion and a central portion disposed between the pin-holding portion and the end portion. The central portion has a first bearing portion. The outer housing portion has a first end and a second end and includes a second bearing portion. The shaft is disposed within the outer housing portion and is moveable relative to the outer housing portion. The neck portion is disposed at the first end. The second bearing portion is stationary relative to the neck portion. The first bearing portion is movable relative to the second bearing portion.