Pine Shaped Metal Nano-Grating Fabrication
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Solution Overview
Problem
Existing methods for creating metal nanostructures struggle to achieve specific three-dimensional morphologies, particularly for metals like gold, due to limitations in etching rates and mask fabrication, leading to difficulties in obtaining precise nanostructures.
Innovation Solution
A pine-shaped metal nano-scaled grating is fabricated using a substrate with deposited metal layers and an isolation layer, etched using a mask layer to form triangular and rectangular structures, allowing for precise control of nanostructure dimensions and arrangement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If chemical corrosion methods are used to create metal nanostructures, then the processing can be performed, but it is difficult to achieve a nanostructure having a specific morphology
Solution Approach 1:
The patent replaces chemical corrosion methods with physical vapor deposition (PVD) and focused ion beam (FIB) etching methods. The PVD process deposits metal layers with controlled thickness, while FIB etching uses physical ion bombardment to remove material, eliminating the need for chemical reagents and enabling precise control over nanostructure morphology.
Solution Approach 2:
The patent changes the processing parameters by using controlled deposition thickness (e.g., 50nm, 100nm, 200nm) and FIB etching conditions (ion beam energy, angle, duration) to achieve specific three-dimensional metal nanostructure shapes. By adjusting these parameters, precise control over nanostructure morphology is achieved without relying on chemical corrosion.
2Manufacturing precision
If dry etching methods are used, then etching can be performed, but the etching rate depends on reaction surface orientation making it difficult to obtain specific three-dimensional nanostructures
Solution Approach 1:
The patent applies preliminary action by first depositing multiple metal layers with different thicknesses using PVD before performing FIB etching. This preliminary structuring allows the subsequent etching process to reveal predetermined three-dimensional shapes, overcoming the limitation of orientation-dependent etching rates and enabling precise control over final nanostructure morphology.
3Manufacturing precision
If FIBIE method is used, then inclined trough structures can be obtained, but the sizes are too large and it is difficult to obtain etching masks
Solution Approach 1:
The patent transitions from two-dimensional etching masks to three-dimensional metal layer structures by depositing multiple metal layers with varying thicknesses. This dimensional approach allows the metal layers themselves to serve as the structural definition, eliminating the need for separate etching masks and enabling precise nanoscale dimensions without mask fabrication challenges.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method enables the creation of precise pine-shaped metal nanostructures with controlled dimensions, achieving narrowband resonance and broadband absorption capabilities, enhancing optical properties and applications in nano-optics and surface plasmon resonance.
Implementation Method 1
a first metal layer 120 is formed on the substrate 100, an isolation layer 130 is formed on the first metal layer 120, and a second metal layer 140 is formed on the isolation layer 130
Implementation Method 2
The plurality of three-dimensional nanostructures 110 are pine shaped structures... etching the second metal layer 140 to obtain a plurality of parallel and spaced triangular prism structures 141
Data Source
AI summary
A pine shaped metal nano-scaled grating, the grating including a substrate and a plurality of three-dimensional nanostructures located on the substrate, wherein each three-dimensional nanostructure comprises a first rectangular structure, a second rectangular structure, and a triangular prism structure; the first rectangular structure is located on the substrate, the second rectangular structure is located on the first rectangular structure, the triangular prism structure is located on the second rectangular structure, a first width of a bottom surface of the triangular prism structure is equal to a second width of a first top surface of the second rectangular structure and greater than a third width of a second top surface of the first rectangular structure, and the first rectangular structure comprises a first metal and the triangular prism structure comprises a second metal.