Pivotally Actuated Seal Plate for Plasma Isolation
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Solution Overview
Problem
Conventional remote plasma source isolation devices suffer from degradation of sealing mechanisms due to exposure to gas radicals, gas ions, and corrosive or erosive process gases, requiring frequent maintenance and resulting in reduced utilization of process chambers.
Innovation Solution
The isolation device features a pivotally disposed closure mechanism with a seal plate and cross-arm configuration, utilizing a shaft and seal plates with concentric seals, and a cover plate to minimize exposure and facilitate easy maintenance, ensuring a hermetic seal and reducing maintenance needs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a simple valve is utilized in a flowline between the remote plasma source and the port, then the device complexity is reduced, but the sealing mechanism degrades due to exposure to gas radicals, gas ions, and corrosive process gases
Solution Approach 1:
The isolation device is divided into separate components: a body, a closure mechanism with seal plate, and a cross-arm actuation system. This segmentation allows the seal plate to be isolated from direct exposure to corrosive gases while maintaining the isolation function, thereby protecting the sealing mechanism from degradation.
Solution Approach 2:
The patent introduces an intermediary sealing arrangement where the seal plate acts as a mediator between the process chamber and the remote plasma source. The seal plate is positioned to prevent direct contact between corrosive gases and the sealing mechanism, thereby protecting the seals from degradation while maintaining isolation effectiveness.
2Ease of operation
If the isolation device uses traditional sealing mechanisms exposed to process gases, then the ease of operation is maintained, but frequent maintenance is required due to seal degradation
Solution Approach 1:
The sealing mechanism is extracted from the main flow path and positioned within the isolation device body, away from direct exposure to corrosive process gases. This extraction protects the seals from degradation, reducing maintenance frequency while maintaining operational simplicity through the pivotally disposed closure mechanism.
Solution Approach 2:
The seal plate is pre-positioned in a closed position that prevents exposure of the sealing mechanism to corrosive gases before they can cause degradation. This preliminary protective action extends seal life and reduces maintenance requirements while maintaining ease of operation through simple pivotal movement.
3Reliability
If the sealing mechanism is exposed to corrosive gases and ions, then the isolation function is maintained, but the maintenance interval is reduced requiring frequent servicing
Solution Approach 1:
The seal plate utilizes a flexible sealing surface that maintains contact with the body to ensure hermetic isolation while being protected from direct exposure to corrosive gases. This flexible sealing approach maintains reliable isolation function while extending the maintenance interval by protecting the seal material from degradation.
Solution Approach 2:
The design creates a protected environment for the sealing mechanism by positioning it away from direct exposure to corrosive process gases and plasma byproducts. This effectively creates an inert environment for the seals, extending their service life and maintenance interval while maintaining reliable isolation function.
4Reliability
If frequent maintenance is performed to repair or replace the sealing mechanism, then the reliability is maintained, but the process chamber utilization is reduced due to lengthy outages
Solution Approach 1:
The design incorporates protective features that cushion against seal degradation by preventing direct exposure to corrosive gases. This beforehand protection extends the time between maintenance operations, increasing process chamber utilization while maintaining system reliability through extended seal life.
Data Source
AI summary
The present disclosure generally relates to an isolation device for use in processing systems. The isolation device includes a body having a flow aperture formed therethrough. In one embodiment, the isolation device is disposed between a remote plasma source and a process chamber. A closure mechanism is pivotally disposed within the body. The closure mechanism can be actuated to enable or disable fluid communication between the remote plasma source and the process chamber. In one embodiment, the closure mechanism includes a shaft and a seal plate coupled to the shaft. A cross-arm is coupled to the shaft opposite the seal plate. The cross-arm is configured to selectively rotate the shaft and the seal plate of the closure mechanism.


