Pixel Electrode Trench Structure for Display Devices
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Solution Overview
Problem
Display devices, such as organic light emitting diode displays, face issues with corrosion and protrusions of pixel electrodes and high consumption of photoresist due to the arrangement and formation of layers, which affect light transmittance and efficiency.
Innovation Solution
A display device design featuring a substrate with a pixel area and a transmission area, where a wall and planarization layer are formed of the same material, with the pixel electrode extending in a trench between them, and a pixel definition layer covering the electrode's edge, minimizing photoresist usage and preventing corrosion. The manufacturing method includes forming a transistor, planarization layer, and pixel electrode, with an etching preventing layer in the transmission area to reduce photoresist consumption.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If layers are removed in the transmission area to improve light transmittance, then light transmittance is improved, but corrosion and protrusions of the pixel electrode occur
Solution Approach 1:
The display area is divided into pixel areas and transmission areas, with the transmission area further segmented into first and second transmission areas. This segmentation allows different layer configurations in different regions, enabling high light transmittance in transmission areas while maintaining pixel electrode integrity through the wall structure that separates different functional zones.
Solution Approach 2:
A wall structure is introduced as an intermediary element between the pixel area and transmission area. This wall prevents direct exposure of the pixel electrode to the transmission area environment, thereby preventing corrosion and protrusions while allowing light to pass through the transmission area effectively.
2Manufacturing precision
If photoresist is used extensively in the formation process, then manufacturing precision is improved, but photoresist consumption increases
Solution Approach 1:
The wall structure is formed by extracting or removing the organic insulating layer in specific regions, creating a defined structure without requiring extensive photoresist application. This selective removal approach reduces photoresist consumption while maintaining manufacturing precision for the layer formation process.
Data Source
AI summary
A display device according to an exemplary embodiment includes: a substrate including a pixel area and a transmission area adjacent to the pixel area; a transistor positioned on the substrate in the pixel area; a planarization layer positioned on the transistor in the pixel area; a wall positioned on the substrate between the pixel area and the transmission area; and a pixel electrode positioned on the planarization layer and extending in a trench between the planarization layer and the wall.