Pixel Structure Connection Electrode Merging Scan Data Lines
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Solution Overview
Problem
The production process of In-Cell Touch panels is complicated and prone to yield reduction due to the etching process of connection electrodes, leading to Mura defects and increased production time.
Innovation Solution
A pixel structure is designed with a connection electrode comprising a first and second connection layer, where the first connection layer intersects with scan lines and the second connection layer crosses with data lines, allowing electrical coupling through via holes, simplifying the array substrate manufacturing process and reducing the risk of strip defects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If additional independent processes are used to form connection electrodes, then the connection electrodes can be manufactured, but the manufacturing process becomes more complicated and production time increases
Solution Approach 1:
The connection electrodes are merged with the scan lines and data lines by forming them in the same pattern layer. The first connection layer is in the same pattern layer as scan lines and the second connection layer is in the same pattern layer as data lines, allowing simultaneous formation during the same manufacturing process, thus eliminating additional independent processes
Solution Approach 2:
The scan lines and data lines serve dual functions: they function as signal transmission lines and simultaneously serve as connection electrodes for coupling pixel areas. This multi-functionality eliminates the need for separate connection electrode structures
2Manufacturing precision
If additional independent processes are used to form connection electrodes, then the connection electrodes can be manufactured, but production time increases
Solution Approach 1:
The formation of connection electrodes is merged with the formation of scan lines and data lines in the same manufacturing process. Both connection layers are formed simultaneously with their respective signal lines through the same patterning and deposition steps, eliminating sequential processing time
Solution Approach 2:
The connection layers are formed preliminarily during the standard TFT fabrication process before final assembly, so that when the display device is assembled, the connection electrodes are already in place and functional
3Manufacturing precision
If etching process is used for M3 connection electrodes, then connection electrodes can be formed, but Mura defects occur and yield is reduced
Solution Approach 1:
The problematic etching process for M3 connection electrodes is extracted and removed from the manufacturing process. Instead of using etching to form connection electrodes, the invention uses the existing scan lines and data lines that are formed through standard deposition and patterning processes without requiring additional etching steps
Data Source
AI summary
The present invention provides a pixel structure, comprising scan lines, data lines and pixel areas, and the scan lines are separately arranged in parallel along a horizontal direction, and the data lines are separately arranged in parallel along a vertical direction, and the scan lines and the data lines overlap with each other to form the pixel areas, and the pixel structure further comprises a connection electrode employed to coupled to pixel areas, and the connection electrode comprises a first connection layer and a second connection layer, and the first connection layer is in the same pattern layer with the scan lines and intersects with the scan lines, and the first connection layer at an intersecting position with the scan line is disconnected, and the second connection layer is in the same pattern layer with the data lines and crosses with the scan lines.