Pixel Structure Gray-Tone Mask Aperture Ratio
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Solution Overview
Problem
Current liquid crystal display devices have high manufacturing costs and low aperture ratios due to complex pixel structure fabrication processes and wide black matrices between adjacent pixel structures.
Innovation Solution
A pixel structure with a base substrate, pixel electrode, active layer, and source-drain electrode layer, where the active layer is between the base substrate and the source-drain electrode layer, and the pixel electrode is located between the base substrate and the common electrode, using a gray-tone mask process to reduce production costs and increase aperture ratio.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a conventional pixel structure fabrication process is used, then the manufacturing process is well-established and reliable, but the manufacturing cost is high and the aperture ratio is low
Solution Approach 1:
The patent merges the formation of the active layer and source-drain electrode layer into a single gray-tone mask process step. By using a gray-tone mask, both layers are patterned simultaneously, reducing the number of separate fabrication steps and lowering manufacturing costs while maintaining production reliability
Solution Approach 2:
The gray-tone mask process serves multiple functions: it patterns both the active layer and source-drain electrode layer in one step, and it defines the alignment between these layers. This multi-functionality reduces the overall fabrication process complexity and contributes to lower manufacturing costs
2Area of stationary object
If a conventional pixel structure with separate active layer and source-drain electrode layer edges is used, then the manufacturing process is simpler, but the aperture ratio is reduced due to wide black matrices
Solution Approach 1:
The patent applies local quality by creating a gray-tone mask with varying optical densities in different regions. The mask has a first region with a first optical density for patterning the active layer and a second region with a second optical density for patterning the source-drain electrode layer, enabling precise local control over layer formation and edge alignment
Solution Approach 2:
The patent changes the optical density parameter of the mask material across different regions to achieve different patterning effects. By controlling the optical density, the patent precisely controls the exposure dose to the photoresist, thereby achieving accurate edge alignment between the active layer and source-drain electrode layer, which maximizes the aperture ratio
Data Source
AI summary
A pixel structure and a manufacturing method therefor, an array substrate, and a display device are provided. The pixel structure includes a pixel electrode, an active layer, a source/drain electrode layer, and a common electrode which are located on a base substrate. The pixel electrode is located between the base substrate and the common electrode. The source/drain electrode layer includes a first electrode and a second electrode which are electrically connected to the active layer, and the second electrode is electrically connected to the pixel electrode. The active layer is located between the base substrate and the source/drain electrode layer. The active layer includes a first surface close to the source/drain electrode layer. The source/drain electrode layer includes a second surface close to the active layer. Partial edge of the first surface is aligned with partial edge of the second surface.