Placing Table Structure for Focus Ring Temperature Separation

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Existing plasma processing apparatuses face challenges in achieving a significant temperature difference between the workpiece and the focus ring, as the adhesive used to attach the support member for the focus ring deteriorates at high temperatures, limiting the calorific value of the heater electrodes and preventing efficient temperature control.

Innovation Solution

A placing table with a support member featuring a ceramic sintered compact intermediate layer and a thermally sprayed ceramic layer, which increases heat resistance and allows for independent temperature control of the focus ring, using a heater electrode within the thermally sprayed ceramic layer and a conductive ceramic power feeding contact to manage thermal stress.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Temperature

If a heater electrode is used to heat the focus ring, then the temperature of the focus ring can be controlled, but the adhesive used to attach the support member deteriorates at high temperatures, limiting the calorific value of the heater electrode

Engineering Contradiction:
Improvetemperature difference between workpiece and focus ringVSAvoidadhesive durability
Core Design Contradiction:
TemperatureVSReliability

Solution Approach 1:

A support member is introduced as an intermediary component between the heater electrode and the focus ring. The support member has a thermal conductivity lower than that of the focus ring, allowing it to block heat transfer from the heater electrode to the workpiece while still enabling the focus ring to be heated to the required temperature. This resolves the contradiction by protecting the adhesive from excessive heat while maintaining effective focus ring heating.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The thermal conductivity parameter of the support member is specifically selected to be lower than that of the focus ring. This parameter change creates a thermal barrier that prevents heat from reaching the adhesive layer, thereby protecting it from deterioration while allowing the focus ring to achieve the necessary temperature for processing.

Inventive Principle:
Principle #35Parameter changes

2Productivity

If the calorific value of the heater electrode is increased to achieve higher focus ring temperature, then temperature control improves, but thermal stress and adhesive deterioration worsen

Engineering Contradiction:
Improveprocessing efficiencyVSAvoidthermal stress
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

The support member serves as a thermal mediator that allows controlled heat transfer. Its lower thermal conductivity creates a gradient that enables the heater electrode to operate at high calorific values for efficient processing while preventing excessive heat from reaching the adhesive and workpiece, thereby reducing thermal stress and preventing adhesive deterioration.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The support member creates a localized thermal environment where the focus ring can be heated to high temperatures for efficient processing, while the adhesive region remains protected at lower temperatures. This local differentiation of thermal conditions allows high productivity without the harmful effects of widespread thermal stress.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration enables a greater temperature difference between the workpiece and the focus ring, allowing for improved processing accuracy and efficiency by suppressing adhesive temperature rise and reducing thermal expansion issues, thus enhancing the heating of the focus ring.

Implementation Method 1

an electrostatic chuck configured to attract the workpiece

Methodology Applied
Scientific EffectElectrostatic attraction: Electrostatics

Implementation Method 2

a heater electrode provided within the thermally sprayed ceramic layer

Methodology Applied
Scientific EffectJoule heating: Joule Heating

Implementation Method 3

a thermally sprayed ceramic layer formed on the intermediate layer by a thermal spraying method

Methodology Applied
Scientific EffectThermal spraying: Plasma Spray

Data Source

PatentUS11743973B2Placing table and plasma processing apparatus
Publication Date: 2023.08.29 TOKYO ELECTRON LTD
  • US11743973B2 patent drawing
  • US11743973B2 patent drawing
  • US11743973B2 patent drawing

AI summary

Provided is a placing table configured to place a workpiece thereon. The placing table includes: an electrostatic chuck configured to attract the workpiece; a support member configured to support a focus ring; and a metal base having a first region configured to support the electrostatic chuck and a second region configured to support the support member, the second region surrounding the first region. The support member includes: an intermediate layer formed of a ceramic sintered compact and supported on the second region via an adhesive; a thermally sprayed ceramic layer formed on the intermediate layer by a thermal spraying method; and a heater electrode provided within the thermally sprayed ceramic layer. The heater electrode is formed by the thermal spraying method.