Planar Hall Effect Sensor EMI Compensation in Electron Beam Tools
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Solution Overview
Problem
Scanning electron microscopes in semiconductor fabrication plants face challenges in accurately evaluating and compensating for electromagnetic interference (EMI) within the vacuum chamber, which causes electron beam deviations, as existing solutions are either insensitive or impractical to position sensors within the electron beam tool.
Innovation Solution
Employing highly sensitive and compact planar Hall Effect magnetic sensors integrated with magnetic flux concentrators to measure and estimate EMI-induced deviations, allowing for precise adjustment of the electron beam trajectory using deflectors to maintain an expected scan pattern.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If traditional magnetic sensors are used to measure electromagnetic interference within the vacuum chamber, then the sensor can detect magnetic field variations, but the sensor is either insensitive to weak EMI signals or impractical to position within the electron beam tool
Solution Approach 1:
The patent replaces traditional bulky magnetic sensors with planar Hall Effect sensors that utilize solid-state magnetic field detection. This substitution enables high-sensitivity EMI measurement while allowing compact integration within the electron beam tool's vacuum chamber environment, resolving the contradiction between detection sensitivity and positioning feasibility
Solution Approach 2:
The patent changes the operational parameters of the magnetic sensing system by using planar Hall Effect sensors with specific geometric configurations and material properties. This parameter change enables the sensor to achieve both high sensitivity to weak EMI signals and compact form factor for practical positioning within the electron beam tool
2Manufacturing precision
If the electron beam trajectory is adjusted to compensate for EMI-induced deviations, then the beam can follow the expected scan pattern, but the system requires real-time measurement and complex control adjustments
Solution Approach 1:
The patent implements a feedback control system where planar Hall Effect sensors continuously measure EMI-induced electron beam deviations, and the measured data is used to generate compensating signals that adjust the beam trajectory in real-time. This feedback mechanism achieves high scan accuracy while managing system complexity through efficient signal processing
Solution Approach 2:
The patent introduces planar Hall Effect sensors as intermediary devices that measure the magnetic field environment and translate it into actionable compensation signals. These sensors act as mediators between the EMI sources and the electron beam control system, enabling precise compensation without requiring direct manipulation of the beam path
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively compensates for EMI-induced deviations, ensuring the electron beam follows its intended path with high accuracy, reducing distortion and maintaining the integrity of scan patterns, even in the presence of strong EMI sources.
Implementation Method 1
obtaining measurement information about a magnetic field within an electron beam tool, the measurement information is generated by at least one planar Hall Effect magnetic sensor that is located within the electron beam tool
Implementation Method 2
the at least one planar Hall Effect magnetic sensor comprises at least one magnetometer integrated with at least one magnetic flux concentrator
Implementation Method 3
setting a trajectory of the electron beam to compensate for the electromagnetic interference induced deviation of the electron beam
Data Source
AI summary
A method, a non-transitory computer readable medium and a system for compensating for an electromagnetic interference induced deviation of an electron beam. The method may include obtaining measurement information about a magnetic field within an electron beam tool, the measurement information is generated by at least one planar Hall Effect magnetic sensor that is located within the electron beam tool; wherein the at least one planar Hall Effect magnetic sensor comprises at least one magnetometer integrated with at least one magnetic flux concentrator; estimating the electromagnetic interference induced deviation of the electron beam, the estimating is based on the magnetic field; and setting a trajectory of the electron beam to compensate for the electromagnetic interference induced deviation of the electron beam.