Planar Microneedle Forming for Precise Drug Loading and Demolding
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Solution Overview
Problem
Conventional microneedle patches face challenges in precise drug dosage control due to drug dispersion and contamination issues during manufacturing, along with high demolding resistance, leading to inconsistent dosages and increased production difficulties.
Innovation Solution
A two-step forming process is employed to create a planar microneedle with a first sidewall and base layer in the same plane, allowing the microneedle to rotate to an angle of 0° to ±10°, reducing forming groove depth and aspect ratio, and using a manufacturing device with specific grooves and a standing device to ensure precise drug loading and easy demolding.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If high-pressure filling or vacuum suction is used to infuse drug-loaded solution into forming grooves, then microneedles can be formed with perpendicular extension, but drug dispersion occurs leading to inconsistent dosage and contamination
Solution Approach 1:
The forming groove is segmented into multiple independent cavities, each capable of holding drug-loaded solution separately. This segmentation prevents drug dispersion between cavities and allows precise control of drug loading in each microneedle, eliminating the contamination and dosage inconsistency problems associated with conventional filling methods
Solution Approach 2:
The drug-loaded solution is pre-loaded into the forming groove cavities before microneedle formation. This preliminary action ensures that the drug is already positioned in the correct location, eliminating the need for high-pressure filling or vacuum suction that cause drug dispersion and contamination
2Length of moving object
If deep forming grooves are used for microneedle fabrication, then microneedles can achieve required length, but demolding resistance increases making removal difficult
Solution Approach 1:
The forming groove cavities are designed with curved surfaces and optimized aspect ratios rather than deep vertical shapes. This curvature reduces the contact area and adhesion forces between the formed microneedles and the mold walls, significantly lowering demolding resistance while still achieving the required microneedle length
Solution Approach 2:
The aspect ratio and depth of the forming grooves are optimized to reduce demolding resistance. By adjusting the geometric parameters of the forming grooves, the patent achieves a balance between microneedle length requirements and ease of demolding, making the manufacturing process more efficient
3Productivity
If conventional molding processes are used, then microneedle patches can be produced, but drug dosage control is inconsistent due to solution traversal and distribution variability
Solution Approach 1:
The forming groove is divided into multiple independent cavities that prevent solution traversal between regions. Each cavity independently holds the drug-loaded solution, ensuring consistent drug distribution and dosage control while maintaining efficient batch production of microneedle patches
Solution Approach 2:
The patent introduces a gelatinous substance as an intermediary medium to hold the drug-loaded solution in the forming groove cavities. This intermediary prevents solution migration and ensures uniform drug distribution, achieving precise dosage control without compromising production efficiency
Data Source
AI summary
A planar microneedle includes a base layer, and microneedle(s) including a needle tip, a middle part, and a needle base. The microneedle further includes a first side-wall located on the same plane as the base layer, a circumferential side-wall, and a third side-wall, the first side-wall and the circumferential side-wall being located circumferentially around the microneedle, and the third side-wall being located at the bottom of the microneedle. The third side-wall includes a first edge connected with the base layer, and a movable edge. The microneedle is rotated around the first edge until an angle between the third side-wall and the plane where the base layer is located is 0°-±10°, and a base through-hole is formed at the junction of the microneedle and the base layer. A microneedle patch, a planar microneedle manufacturing device, a planar microneedle preparation method, and a planar microneedle standing device are provided.