Planar to Non-Planar Design Conversion Using CAD Look-Up Tables
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Solution Overview
Problem
Conventional planar MOS transistors face challenges in scaling down below 65 nm, and while FinFET technology offers improvements, there is a need for a cost-effective method to convert planar designs to non-planar designs with enhanced process compatibility.
Innovation Solution
A method involving a CAD tool-based process where a diffusion region pattern is received, and a look-up table is queried to determine the number and length of fin patterns, which are then formed to convert the planar design into a non-planar design, potentially using optical proximity correction to adjust fin lengths as needed.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If FinFET device is used to replace planar MOS transistor, then device performance and channel control are improved, but manufacturing cost and process complexity increase
Solution Approach 1:
The patent applies preliminary action by performing planar-to-non-planar conversion during the design stage using CAD tools and look-up tables, rather than during manufacturing. This allows the conversion to be automated and standardized, reducing manufacturing complexity and cost while maintaining the performance benefits of FinFET structures
Solution Approach 2:
The patent introduces an intermediary conversion process that translates planar design patterns into non-planar FinFET patterns through CAD tools and look-up tables. This intermediary step acts as a bridge between the simple planar design process and the complex FinFET manufacturing process, making the transition more manageable and cost-effective
2Productivity
If planar design is converted to non-planar design, then device performance is improved, but conversion complexity and process difficulty increase
Solution Approach 1:
The patent segments the conversion process into discrete, manageable steps: receiving diffusion region patterns, querying look-up tables for conversion parameters, and generating fin patterns through CAD tools. This segmentation breaks down the complex conversion process into standardized operations that are easier to implement and control
Solution Approach 2:
The patent utilizes parameter changes by employing look-up tables that store pre-determined conversion parameters. By changing design parameters through automated queries and calculations rather than manual redesign, the conversion process becomes more systematic and less complex, enabling efficient transformation from planar to non-planar geometries
Data Source
AI summary
A planar design to non-planar design conversion method includes following steps. At least a diffusion region pattern including a first side and a second side perpendicular to each other is received. A look-up table is queried to obtain a first positive integer according to the first side of the diffusion region pattern and a second positive integer according to the second side of the diffusion region pattern. Then, a plurality of fin patterns is formed. An amount of the fin patterns is equal to the second positive integer. The fin patterns respectively include a first fin length, and the first fin length is a product of the first positive integer and a predetermined value. The forming is performed by at least a computer-aided design (CAD) tool.