Planar Passivation Structure for Thinner IC Polymer Layers
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In the formation of integrated circuits, achieving a planar top surface for polymer layers over non-planar dielectric layers and metal pads is challenging, leading to increased polymer thickness and overall device die thickness.
Innovation Solution
A method involving the formation of a planarization layer with a planar top surface over the metal pad, followed by the deposition of a polymer layer, which extends into openings in the planarization layer to contact the metal pad, thereby achieving a planar top surface without the need for excessive polymer thickness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a polymer layer is formed over non-planar dielectric layers and metal pads, then the metal pad is protected and electrically connected, but the top surface of the polymer layer becomes non-planar, requiring increased polymer thickness which increases overall device die thickness
Solution Approach 1:
A planarization layer is formed over the non-planar dielectric layers and metal pads before forming the polymer layer. This preliminary planarization action creates a planar top surface that enables the subsequent polymer layer to be formed with reduced thickness while maintaining planarity, thus resolving the contradiction between surface planarity and device thickness
Solution Approach 2:
The planarization layer acts as an intermediary structure between the non-planar underlying layers (dielectric layers and metal pads) and the polymer layer. It mediates the transition from non-planar to planar surface, allowing the polymer layer to achieve the required planarity without increasing overall device thickness
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for a more planar top surface of the polymer layer, reducing the overall thickness of the device dies and improving wafer-to-wafer bonding efficiency.
Implementation Method 1
A planarization layer is deposited over the metal pad. The planarization layer includes a bottom surface over the metal pad and a planar top surface
Data Source
AI summary
A method includes forming a first passivation layer, forming a metal pad over the first passivation layer, forming a planarization layer having a planar top surface over the metal pad, and patterning the planarization layer to form a first opening. A top surface of the metal pad is revealed through the first opening. The method further includes forming a polymer layer extending into the first opening, and patterning the polymer layer to form a second opening. The top surface of the metal pad is revealed through the second opening.


