Planar Plasma Source With Segmented Tiles For Homogeneous Delivery
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Solution Overview
Problem
Current plasma sources face challenges in achieving homogeneous plasma delivery over large surfaces due to dimensional tolerances and temperature constraints, leading to incomplete treatment and increased costs, especially when scaling up to treat substrates up to 3 meters in width.
Innovation Solution
A plasma source design with a counter electrode and working electrode configuration, including multiple planar tiles with dielectric layers and geometric modifications near edges to enhance gas flow and plasma generation, ensuring uniform plasma delivery across the substrate surface, even at elevated temperatures.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If a linear array of plasma elements is used to treat large surfaces, then the treatment area is increased, but areas under the boundary between individual elements are not treated and homogeneity is compromised
Solution Approach 1:
The patent transitions from a one-dimensional linear array of plasma elements to a two-dimensional planar plasma source configuration. The plasma generating element has a large planar surface area with multiple apertures arranged in a grid pattern, allowing plasma to be delivered to the entire substrate surface simultaneously without leaving untreated boundary areas between elements.
2Area of stationary object
If multiple rows of linear arrays are constructed with overlapping treatment elements, then coverage is improved, but the system complexity and cost increase
Solution Approach 1:
The patent merges multiple plasma generation functions into a single planar plasma source. Instead of using multiple separate linear arrays that overlap, the invention integrates multiple apertures within one planar element, delivering plasma uniformly across the entire treatment area from a single coordinated source, thereby reducing system complexity.
3Productivity
If the plasma source is scaled up to treat 3 meter wide substrates, then the treatment capacity is increased, but dimensional tolerances and temperature control become difficult to maintain
Solution Approach 1:
The patent segments the large planar plasma source into multiple smaller aperture units arranged in a grid pattern. Each aperture acts as an independent plasma delivery point, making it easier to manufacture with precise tolerances while collectively covering large substrate areas. This segmentation allows the system to maintain manufacturing precision even at large overall dimensions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design enables efficient and homogeneous delivery of reactive plasma species over large surfaces, reducing treatment time and space requirements, and is suitable for applications like atomic layer deposition and plasma-enhanced chemical vapor deposition.
Implementation Method 1
a tile comprises at least one film shaped conductive layer that is at least in part enclosed by a dielectric layer
Implementation Method 2
plasma generated in these spaces may be transported to the aperture from which it is delivered to the surface of a substrate to be processed
Data Source
AI summary
A plasma source (100), comprises an outer face (10) with an aperture (14) for delivering a plasma from the aperture. A transport mechanism is configured to transport a substrate (11) and the plasma source relative to each other parallel to the outer face, with a substrate surface to be processed in parallel with at least a part of the outer face that contains the aperture. First (4-1) and second tile (4-2) are arranged within a first plane of a working electrode (22) with neighbouring edges (12) bordering a first plasma collection space (6-1) and a third tile (4-3) is arranged in a second plane of the working electrode parallel to the first plane such that the third tile overlaps neighbouring edges in the first plane. At least one of the working and counter electrodes comprises a local modification (13,15) near said neighbouring edges to increase a plasma delivery to the aperture compensating for loss of plasma collection due to the neighbouring edges.