Planarized Photodetector Waveguide Structure for Stress-Free Integration

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Solution Overview

Problem

The manufacturing process of photodetectors using crystalline materials like germanium or III-V compounds often results in stress-induced defects due to encapsulation on non-planar surfaces, leading to reduced 3 dB bandwidth and light collection efficiency.

Innovation Solution

The method involves forming a photodetector fully landed on a planar surface of an optical waveguide, using shallow trench isolation structures and dielectric layers to encapsulate and crystallize the photodetector material, thereby eliminating stress and defects.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If the photodetector is formed on non-planar surfaces created by STI structures, then the manufacturing process is simplified, but stress-induced defects are created that reduce 3 dB bandwidth and light collection efficiency

Engineering Contradiction:
Improvemanufacturing process simplicityVSAvoidphotodetector performance
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

A planarization layer is formed over the shallow trench isolation structures before forming the photodetector. This preliminary planarization action creates a flat surface for subsequent photodetector formation, preventing stress-induced defects while maintaining the simplified STI manufacturing process. The planarization layer is deposited to fill in the non-planar features created by STI, providing a uniform base for the photodetector active region.

Inventive Principle:
Principle #10Preliminary action

2Reliability

If encapsulation films are formed on non-planar surfaces, then the crystalline structure is protected, but stress creates breaches in encapsulation leading to defects

Engineering Contradiction:
Improvecrystalline structure protectionVSAvoidencapsulation integrity
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

The planarization layer is deposited over the STI structures before the encapsulation films are formed. This preliminary action ensures that the encapsulation films are deposited on a planar surface, preventing stress-induced breaches and maintaining encapsulation integrity while still providing protection for the crystalline photodetector structure.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The planarization layer acts as an intermediary between the non-planar STI structures and the encapsulation films. It mediates the stress distribution, preventing direct transmission of stress from the non-planar underlying structures to the encapsulation films, thereby maintaining encapsulation integrity.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Adaptability or versatility

If rapid melt growth is used to deposit amorphous films at low temperatures, then integration flexibility is improved, but thermal crystallization creates stress on encapsulation films

Engineering Contradiction:
Improveintegration flexibilityVSAvoidencapsulation film stress
Core Design Contradiction:
Adaptability or versatilityVSStress or pressure

Solution Approach 1:

The planarization layer serves as a stress-absorbing intermediary between the crystallizing photodetector material and the encapsulation films. When the amorphous photodetector material undergoes thermal crystallization, the planarization layer accommodates the associated stress, preventing transmission of stress to the encapsulation films and avoiding breaches.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach significantly reduces defects and enhances light collection efficiency by ensuring the photodetector is fully landed on a planar surface, improving the 3 dB bandwidth and responsivity of the photodetector.

Implementation Method 1

amorphous or polycrystalline films (e.g., germanium or III-V compounds) can be deposited at low temperatures in an amorphous or polycrystalline state, and then crystallized thermally

Methodology Applied
Scientific EffectCrystallization: Crystallisation

Implementation Method 2

During the crystallization anneal, though, the amorphous or polycrystalline material (e.g., Ge) expands and contracts, creating stress on the encapsulation films

Methodology Applied
Scientific EffectThermal expansion: Thermal Expansion

Data Source

PatentUS10957805B2Integrated photodetector waveguide structure with alignment tolerance
Publication Date: 2021.03.23 INTERNATIONAL BUSINESS MACHINE CORPORATION
  • US10957805B2 patent drawing
  • US10957805B2 patent drawing
  • US10957805B2 patent drawing

AI summary

An encapsulated integrated photodetector waveguide structures with alignment tolerance and methods of manufacture are disclosed. The method includes forming a waveguide structure bounded by one or more shallow trench isolation (STI) structure(s). The method further includes forming a photodetector fully landed on the waveguide structure.