Plasma Gas Abatement with Staged Reducing and Oxidizing Reactants

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Solution Overview

Problem

Existing plasma abatement apparatuses for semiconductor processing tools have lower-than-required abatement effectiveness and produce undesirable by-products due to the simultaneous introduction of reducing and oxidizing reactants, which leads to unwanted oxide formation.

Innovation Solution

A plasma abatement apparatus that introduces a reducing reactant into a hotter region and an oxidizing reactant into a cooler region of the plasma stream, optimizing the abatement process by limiting oxide formation and enhancing the efficiency of compound breakdown.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If reducing and oxidizing reactants are introduced simultaneously into the plasma stream, then the abatement process is simplified, but unwanted oxide by-products are generated in undesirable quantities

Engineering Contradiction:
Improvereactant introduction systemVSAvoidoxide by-products
Core Design Contradiction:
Device complexityVSObject-generated harmful factors

Solution Approach 1:

The introduction of reactants is segmented into two separate stages: first introducing the reducing reactant into the hot plasma region, then introducing the oxidizing reactant into the cooler downstream region. This segmentation prevents simultaneous interaction that would generate unwanted oxides while maintaining process effectiveness.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different regions of the plasma stream are assigned different qualities/conditions: the upstream region maintains high temperature for reducing reactions, while the downstream region is cooler and suitable for oxidizing reactions. This local quality differentiation enables selective chemical reactions in different zones.

Inventive Principle:
Principle #3Local quality

2Productivity

If reducing reactant is introduced into hot plasma region, then compound breakdown efficiency is enhanced, but thermal oxide generation increases

Engineering Contradiction:
Improvecompound breakdown efficiencyVSAvoidthermal oxides
Core Design Contradiction:
ProductivityVSObject-generated harmful factors

Solution Approach 1:

The reducing reactant is introduced first into the hot plasma region to perform the compound breakdown operation. After this preliminary action is complete, the oxidizing reactant is then introduced in the cooler region to handle the breakdown products, preventing oxide formation from the reducing reactant.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach improves abatement performance by reducing unwanted by-products and NOx emissions, achieving higher efficiency in breaking down fluorinated compounds while minimizing thermal oxide generation.

Implementation Method 1

a plasma device configured to generate a plasma stream from a plasma gas

Methodology Applied
Scientific EffectIonization: Ionisation

Implementation Method 2

a first aperture positioned to deliver a reducing reactant to a first region of the plasma stream

Methodology Applied
Scientific EffectReduction: Reduction

Implementation Method 3

a second aperture positioned to deliver an oxidising reactant to a second region of the plasma stream

Methodology Applied
Scientific EffectOxidation: Oxidation

Data Source

PatentUS20230402260A1Gas abatement by plasma
Publication Date: 2023.12.14 EDWARDS LTD
  • US20230402260A1 patent drawing
  • US20230402260A1 patent drawing
  • US20230402260A1 patent drawing

AI summary

A plasma abatement apparatus includes: a plasma device configured to generate a plasma stream from a plasma gas; an effluent stream aperture configured to convey the effluent stream into the plasma stream for treatment by the plasma stream; a first aperture positioned to deliver a reducing reactant to a first region of the plasma stream; and a second aperture positioned to deliver an oxidising reactant to a second region of the plasma stream, wherein the second region is located at a position of the plasma stream which is cooler than the first region.