Plasma Chamber Antenna Structure for Uniform Electromagnetic Fields
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Solution Overview
Problem
Non-uniform electromagnetic fields in plasma processing chambers result in non-uniform plasma distribution, leading to inconsistent substrate treatment, and existing antennas require calibration or adjustment to maintain uniformity, increasing maintenance costs.
Innovation Solution
The use of a unibody antenna structure with axisymmetric interconnecting structures and axisymmetric cutouts, such as spiral arms, to generate a uniform electromagnetic field, reducing the need for calibration and enhancing plasma uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional antennas are used in plasma processing chambers, then plasma generation is achieved, but non-uniform electromagnetic fields result in non-uniform plasma distribution and inconsistent substrate treatment
Solution Approach 1:
The patent applies asymmetry principle by designing the antenna with a specific non-symmetric geometry consisting of a rectangular waveguide connected to a circular cavity through an elliptical aperture. This asymmetric configuration is optimized to generate uniform electromagnetic fields in the plasma chamber, thereby achieving uniform plasma distribution and consistent substrate treatment without requiring calibration adjustments.
2Reliability
If existing antenna designs are used, then plasma processing is performed, but frequent calibration and adjustment are needed to maintain electromagnetic field uniformity, increasing maintenance costs
Solution Approach 1:
The patent implements preliminary action by designing the antenna structure with pre-optimized asymmetric geometry that inherently maintains electromagnetic field uniformity under various operating conditions. The specific configuration of the rectangular waveguide, elliptical aperture, and circular cavity is predetermined to compensate for potential variations, eliminating the need for frequent calibration and adjustment during operation, thus reducing maintenance costs while ensuring reliable uniform plasma generation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The antenna design ensures a uniform plasma distribution, improving substrate treatment consistency and reducing maintenance costs by maintaining electromagnetic field uniformity without the need for frequent adjustments.
Implementation Method 1
an electromagnetic wave radiated into a plasma chamber generates an electromagnetic field. The generated electromagnetic field heats electrons in the chamber
Implementation Method 2
The generated electromagnetic field heats electrons in the chamber. The heated electrons ignite plasma
Implementation Method 3
a dielectric structure, the dielectric structure being disposed between the radiating structure and the plasma chamber
Data Source
AI summary
An antenna includes an inner structure, an outer structure, and a plurality of interconnecting structures coupling the inner structure to the outer structure. The plurality of interconnecting structures is axisymmetric with respect to a center of the antenna. Each interconnecting structure has an azimuthal component of at least 30 degrees.