Plasma Processing Apparatus Uniform Treatment via Segmented Array
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Solution Overview
Problem
Existing techniques for generating thermal plasma in large areas are ineffective for achieving uniform high-temperature treatment of a base material's surface for a short period, leading to non-uniform treatment and increased costs due to complex configurations and instability.
Innovation Solution
A plasma processing apparatus with a circular chamber and dielectric members that generates plasma using a high-frequency electromagnetic field, allowing for efficient and stable plasma treatment of a base material's surface with a circular plasma ejection port and a solenoid coil, enabling uniform treatment of large areas within a short time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If existing techniques for generating thermal plasma in large areas are used, then the treatment area is increased, but the plasma becomes unstable and the treatment uniformity deteriorates
Solution Approach 1:
The plasma generation system is divided into multiple independent plasma generation units arranged in an array. Each unit generates plasma independently within a defined region, and the collective output covers the entire large treatment area. This segmentation maintains plasma stability in each unit while achieving large-area coverage.
Solution Approach 2:
The invention transitions from a single-point or linear plasma source to a two-dimensional array of plasma generation units. This spatial arrangement in multiple dimensions enables simultaneous plasma generation across large areas while maintaining the stability characteristics of individual units.
2Area of stationary object
If existing techniques for generating thermal plasma in large areas are used, then the treatment area is increased, but the treatment uniformity deteriorates
Solution Approach 1:
The treatment area is divided into multiple discrete regions, each served by an individual plasma generation unit. This segmentation ensures that each region receives uniform plasma treatment from its dedicated unit, and the combination of all regions achieves uniformity across the entire large area.
Solution Approach 2:
Each plasma generation unit is optimized to provide locally uniform plasma treatment within its specific coverage area. The local quality of plasma generation is maximized in each unit, and the arrangement of multiple units ensures overall uniformity across the entire treatment surface.
3Area of stationary object
If complex plasma generation configurations are used to achieve large area treatment, then the treatment area is increased, but the device complexity and cost increase
Solution Approach 1:
The system uses multiple simple, identical plasma generation units arranged in an array rather than a single complex configuration. Each unit has a straightforward structure, and the overall system complexity is managed through the simple repetition and arrangement of these standardized modules.
Solution Approach 2:
The plasma generation units are designed as universal, multi-functional modules that can be arranged in various configurations to treat different area sizes. This universality reduces device complexity by using standardized components rather than custom-designed complex systems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus efficiently generates stable plasma for uniform treatment of large areas, reducing treatment time and costs by maintaining plasma stability and efficiency, even with increased gas flux.
Implementation Method 1
a high-frequency power supply connected to the coil, wherein the chamber has a hollow outside dielectric block formed of a dielectric member having a plasma generation region in the inside and a plasma ejection port at the bottom end
Implementation Method 2
a circular chamber including an opening portion which serves as a plasma ejection port surrounded by a dielectric member
Data Source
AI summary
A plasma processing apparatus has a circular chamber having an opening portion which serves as a plasma ejection port surrounded by a dielectric member, a gas supply pipe for introducing gas into the inside of the chamber, a coil provided in the vicinity of the chamber, a high-frequency power supply connected to the coil, and a base material mounting table.