Plasma Processing Blocking Cover for Vacuum Exhaust Time Reduction
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Solution Overview
Problem
The existing plasma processing apparatuses require lengthy vacuum exhaust times after maintenance due to the exposure of alumite-treated surfaces in both the processing and exhaust chambers to the atmosphere, leading to increased moisture absorption and prolonged vacuum achievement, which negatively impacts productivity.
Innovation Solution
Incorporating a blocking cover mechanism that isolates the processing chamber from the exhaust chamber during maintenance, preventing atmospheric moisture absorption by the alumite-treated surfaces in the exhaust chamber, and optionally using temperature control in the exhaust chamber to enhance gas release.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of repair
If the exhaust chamber is exposed to the atmosphere during maintenance work, then maintenance can be performed on the processing chamber, but the alumite-treated surfaces in the exhaust chamber absorb moisture from the atmosphere, leading to prolonged vacuum exhaust time
Solution Approach 1:
The patent divides the chamber into two separate spaces: the processing chamber (U1) that can be opened for maintenance and the exhaust chamber (U2) that remains isolated. A partition wall with a movable seal member creates this segmentation, allowing independent access to the processing chamber while keeping the exhaust chamber sealed, thus preventing moisture absorption in the exhaust chamber during maintenance operations
Solution Approach 2:
The patent introduces a movable seal member as an intermediary element that can move between two positions: blocking the communication opening between chambers during maintenance to prevent moisture ingress, and allowing communication during normal operation. This intermediary mechanism enables the system to switch between maintenance and operational modes without compromising the exhaust chamber's vacuum integrity
2Ease of repair
If the entire inside of the apparatus is exposed to the atmosphere during maintenance, then maintenance work can be performed, but both the processing chamber and exhaust chamber require lengthy vacuum exhaust afterward
Solution Approach 1:
By segmenting the chamber into isolated sections with selective access, only the processing chamber needs to be opened for maintenance while the exhaust chamber remains sealed. This segmentation ensures that after maintenance, only the processing chamber requires vacuum exhaust, significantly reducing the overall time the apparatus is non-operational and improving productivity
3Reliability
If alumite treatment is applied to the exhaust chamber walls, then plasma resistance is enhanced, but the treated surfaces absorb more moisture from the atmosphere, extending vacuum exhaust time
Solution Approach 1:
The patent applies alumite treatment to both chambers but uses segmentation to isolate the exhaust chamber from atmospheric exposure during maintenance. This allows the exhaust chamber to retain the plasma-resistant alumite coating while preventing the moisture absorption problem that would otherwise extend vacuum exhaust time
Solution Approach 2:
The movable seal member acts as an intermediary that protects the alumite-treated surfaces in the exhaust chamber from atmospheric moisture during maintenance operations, allowing the coating to provide its plasma resistance function without suffering from moisture absorption that would prolong vacuum exhaust time
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly reduces vacuum exhaust time post-maintenance, improving apparatus productivity by minimizing moisture absorption and accelerating the vacuum achievement process.
Implementation Method 1
a blocking cover that is provided in the exhaust chamber to block communication between the inside of the processing chamber and the inside of the exhaust chamber
Implementation Method 2
optionally using temperature control in the exhaust chamber to enhance gas release
Implementation Method 3
an exhaust port 945 is connected to an automatic pressure control ('APC') valve 950 which is in turn connected to a turbo molecular pump ('TMP') 955
Data Source
AI summary
A plasma processing apparatus includes a processing chamber that converts a processing gas introduced from a gas supply source into plasma and performs plasma processing on a target object, an exhaust chamber that communicates with the inside of the processing chamber to exhaust a gas converted into plasma from the processing chamber, and a blocking cover that is provided in the exhaust chamber to block communication between the inside of the processing chamber and the inside of the exhaust chamber.