Plasma Bubbling Nozzle for Chemical-Free Substrate Cleaning
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Solution Overview
Problem
The challenge in semiconductor manufacturing is the efficient removal of contaminants from substrate surfaces without using chemicals, as existing cleaning methods are inefficient and environmentally harmful, especially as circuit patterns shrink, making it difficult to remove impurities between patterns and on the substrate surface.
Innovation Solution
A nozzle and substrate processing apparatus that generates plasma in a treatment liquid by bubbling it with a gas, allowing for efficient cleaning without chemicals, using a liquid supply unit and gas supply unit within the nozzle to create plasma for effective impurity removal, with adjustable electrode positions for optimal plasma generation and gas type selection based on substrate type.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If chemicals are used to remove impurities from substrate surface, then cleaning effectiveness is improved, but environmental pollution increases and handling safety deteriorates
Solution Approach 1:
The patent replaces chemical cleaning methods with a plasma-based physical cleaning system. A nozzle generates plasma by applying voltage to treatment liquid that is bubbling with gas, and dispenses this plasma-containing liquid onto the substrate. The plasma generates reactive species that chemically react with impurities through physical plasma processes rather than traditional chemical solutions, eliminating the need for hazardous chemicals while maintaining cleaning effectiveness.
Solution Approach 2:
The patent changes the physical state and chemical properties of the treatment liquid by generating plasma within the nozzle. By applying voltage to the treatment liquid and causing it to bubble with gas, the liquid transforms into a plasma state containing highly reactive species. This parameter change enables the treatment liquid to effectively remove impurities without requiring traditional chemical cleaners, thus solving the contradiction between cleaning effectiveness and environmental pollution.
2Manufacturing precision
If critical dimension between patterns becomes narrower, then device performance is improved, but difficulty in removing impurities between patterns increases
Solution Approach 1:
The patent employs a nozzle that can be positioned to locally apply plasma treatment to specific areas of the substrate, including narrow spaces between patterns. The plasma generation within the nozzle creates highly reactive species concentrated in the treatment zone, enabling effective cleaning in critical dimensions where traditional methods fail. The liquid supply unit and gas supply unit work together to create plasma locally at the nozzle tip, allowing precise targeting of impurities in narrow gaps.
3Device complexity
If traditional cleaning methods are used, then process simplicity is maintained, but cleaning efficiency deteriorates
Solution Approach 1:
The patent merges multiple functions into a single nozzle structure: the liquid supply unit, gas supply unit, plasma generation electrodes, and dispensing mechanism are all integrated into one device. This combination allows the nozzle to simultaneously perform liquid delivery, gas injection, plasma generation, and treatment liquid dispensing. The integration maintains operational simplicity while achieving superior cleaning efficiency through plasma activation, resolving the contradiction between process simplicity and cleaning efficiency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables efficient and environmentally friendly cleaning of substrates by generating plasma in the treatment liquid, effectively removing impurities while minimizing chemical use and environmental pollution, improving the efficiency of the cleaning process.
Implementation Method 1
The liquid supply unit supplies the treatment liquid in a bubbling state into the interior space, or causes the treatment liquid to bubble in the interior space
Implementation Method 2
electrodes that generate plasma in the interior space
Data Source
AI summary
The inventive concept provides a nozzle for dispensing a treatment liquid in which plasma is generated. The nozzle includes a body having an interior space, a liquid supply unit that supplies the treatment liquid into the interior space, and electrodes that generate the plasma in the interior space. The liquid supply unit supplies the treatment liquid in a bubbling state into the interior space, or causes the treatment liquid to bubble in the interior space.