Plasma Processing Chamber Channel Design for Uniform Gas Flow

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Solution Overview

Problem

Batch processing systems for semiconductor work pieces face challenges in achieving uniform heating and gas pressure, leading to non-uniform processing and high overhead costs, due to shared equipment and structural differences between processing stations.

Innovation Solution

A plasma processing apparatus with a chamber design that includes separate processing stations connected by a channel with a width-to-length ratio of less than 1:3, allowing for controlled gas flow while preventing the exchange of charged particles between stations, using a moveable protection assembly to adjust the channel's dimensions and ensure uniformity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If processing stations share common equipment and resources, then device complexity is reduced, but manufacturing precision deteriorates due to non-uniform processing conditions

Engineering Contradiction:

Improveequipment sharingVSAvoidprocessing uniformity

Core Design Contradiction:

Device complexityVSManufacturing precision

Solution Approach 1:

The processing chamber is divided into multiple independently isolated processing stations, each with its own heating apparatus, gas inlet, and exhaust system. This segmentation allows each station to operate with uniform processing conditions while maintaining overall system functionality.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

A common exhaust system serves as an intermediary component that collects processed gases from multiple independently operated processing stations, allowing resource sharing in a controlled manner that does not compromise processing uniformity.

Inventive Principle:

Principle #24Intermediary (Mediator)

2Manufacturing precision

If processing stations are isolated to maintain uniformity, then manufacturing precision is improved, but device complexity increases due to separate equipment requirements

Engineering Contradiction:

Improveprocessing uniformityVSAvoidstation independence

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

Multiple processing stations share common structural components, support systems, and a unified exhaust collection system, reducing overall device complexity while maintaining independent operation and processing uniformity through selective isolation.

Inventive Principle:

Principle #5Merging (Combining)

Solution Approach 2:

The chamber structure and exhaust system are designed with universal functionality to serve multiple processing stations simultaneously, allowing a single system to perform multiple functions across different stations without compromising individual station performance.

Inventive Principle:

Principle #6Universality (Multi-functionality)

3Stress or pressure

If a wide channel connects processing stations, then gas pressure uniformity is improved, but charged particles are exchanged between stations causing electrical interference

Engineering Contradiction:

Improvegas pressure uniformityVSAvoidelectrical interference

Core Design Contradiction:

Stress or pressureVSObject-affected harmful factors

Solution Approach 1:

A magnetically controllable barrier (such as a plasma shield or magnetic field barrier) is implemented in the channel connecting processing stations. This barrier can be activated to block charged particles while allowing neutral gas molecules to pass through, maintaining gas pressure uniformity without electrical interference.

Inventive Principle:

Principle #30Flexible shells and thin films

Solution Approach 2:

The physical or electromagnetic parameters of the channel are dynamically adjusted to change its permeability properties. By modifying parameters such as magnetic field strength or plasma density in the channel, the system allows neutral gas flow while blocking charged particles under specific operating conditions.

Inventive Principle:

Principle #35Parameter changes

4Productivity

If processing speed is increased, then productivity is improved, but heating uniformity deteriorates

Engineering Contradiction:

Improveprocessing speedVSAvoidheating uniformity

Core Design Contradiction:

ProductivityVSTemperature

Solution Approach 1:

Each processing station has its own independent heating apparatus, allowing simultaneous processing of multiple workpieces at different heating rates or temperatures. This enables high productivity while maintaining optimal heating uniformity for each individual workpiece regardless of processing speed variations.

Inventive Principle:

Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This design enhances uniformity of plasma processing by maintaining balanced gas pressure and preventing electrical interference between stations, thereby improving production consistency and reducing operational costs.

Implementation Method 1

the channel has a width to length ratio of less than about 1:3

Methodology Applied

Scientific EffectFluid flow:

Implementation Method 2

in the processing of semiconductor work pieces employing plasma having active particles which are energized by RF energy

Methodology Applied

Scientific EffectRF energy:

Data Source

PatentUS8414702B2Plasma processing apparatus

Publication Date: 2013.04.09 ADVANCED MICRO FAB EQUIP INC CHINA

AI summary

A plasma processing apparatus is described and which includes a chamber having at least two processing stations which are separated by a wall. At least one channel is formed in the wall, and wherein the channel has a width to length ratio of less than about 1:3.