Replaceable Plasma Chamber Interface With Thermal Choke
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Solution Overview
Problem
The existing upper chamber sections in plasma processing systems are difficult to clean and reseat properly, leading to temperature variability issues that affect plasma processing conditions, and they often require replacement due to thermal mass effects and sensitivity to temperature changes.
Innovation Solution
A replaceable top chamber interface with a monolithic metal cylinder and a ceramic window, featuring a thermal mass for uniformity and a thermal choke to minimize heat transfer, along with a side gas injection system for uniform gas delivery, which includes bifurcated gas lines and symmetrically arranged injectors.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the upper chamber section is made with traditional construction, then it provides structural integrity, but it causes temperature variability and difficulty in cleaning and reseat
Solution Approach 1:
The upper chamber section is divided into separate components: a top chamber interface (248) and an upper chamber section (244). This segmentation allows the top chamber interface to be removed and cleaned separately, improving ease of operation while maintaining the structural integrity of the overall chamber assembly.
2Stability of the object's composition
If the upper chamber section has large thermal mass, then it provides thermal stability, but it causes sensitivity to temperature changes and requires replacement
Solution Approach 1:
The top chamber interface (248) incorporates a thermal mass specifically at its upper portion to provide localized thermal stability where needed. The lower portion includes a thermal choke with reduced thermal mass to minimize heat transfer to the bottom section. This local differentiation of thermal properties allows the system to maintain thermal stability in critical areas while adapting to temperature control requirements.
3Temperature
If heat transfer across the chamber interface is not minimized, then thermal equilibrium is easier to achieve, but temperature variability affects plasma processing conditions
Solution Approach 1:
The top chamber interface (248) incorporates a thermal mass specifically at its upper portion to provide localized thermal stability where needed. The lower portion includes a thermal choke with reduced thermal mass to minimize heat transfer to the bottom section. This local differentiation of thermal properties allows the system to maintain thermal stability in critical areas while adapting to temperature control requirements.
Solution Approach 2:
The top chamber interface (248) acts as a thermal intermediary between the upper chamber section and the bottom section. It includes a thermal mass at its upper portion to absorb and distribute heat uniformly, while its lower portion includes a thermal choke to limit heat transfer to the bottom section. This intermediary structure prevents direct heat transfer paths that would cause temperature variability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design enhances temperature control and uniformity, reduces heat transfer issues, and facilitates easier maintenance and replacement, ensuring consistent plasma processing conditions and improved thermal management.
Implementation Method 1
a thermal mass at an upper portion of the cylinder, the thermal mass defined by a wider portion of the cylinder between the inner surface and an outer surface extending vertically from the upper flange, the thermal mass being effective to provide azimuthal temperature uniformity of the inner surface
Implementation Method 2
a thermal choke at a lower portion of the cylinder effective to minimize transfer of heat across the lower vacuum sealing surface, the thermal choke defined by a thin metal section having a thickness of less than 0.25 inch and extending at least 25% of the length of the inner surface
Implementation Method 3
Induction coil 231 is separated from the plasma by a dielectric window 204 forming the upper wall of the chamber, and generally induces a time-varying electric current in the plasma processing gases to create plasma 220
Implementation Method 4
a heating and cooling apparatus 246 may operate to control the temperature of the upper chamber section 244 of the plasma processing apparatus 202
Data Source
AI summary
An upper chamber section of a plasma reaction chamber includes a ceramic window with blind bores in an upper surface for receipt of a thermal couple and a resistance temperature detector, a top chamber interface which comprises an upper surface which vacuum seals against the bottom of the window and a gas injection system comprising 8 side injectors mounted in the sidewall of the top chamber interface and a gas delivery system comprising tubing which provides symmetric gas flow to the 8 injectors from a single gas feed connection.


