Plasma Chamber Readiness Detection via Electrical Modeling

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Solution Overview

Problem

Plasma processing systems face challenges in determining readiness without generating plasma, leading to resource wastage and false positive alarms due to incomplete troubleshooting.

Innovation Solution

A test system that uses a computer-readable medium with a test program to receive electric parameter values from sensors, generate electric model parameter values, and compare them with baseline information to determine system readiness, avoiding plasma generation and false alarms.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If test wafers are processed with plasma to determine system readiness, then the accuracy of readiness determination is improved, but resource consumption and cost increase substantially

Engineering Contradiction:
Improvereadiness determination accuracyVSAvoidtest wafer consumption
Core Design Contradiction:
Measurement precisionVSLoss of substance

Solution Approach 1:

The patent creates an electrical model that copies the essential electrical characteristics of the plasma processing chamber and compares it with a baseline model. This virtual copy allows readiness determination without physically processing test wafers, thereby eliminating wafer consumption while maintaining diagnostic accuracy.

Inventive Principle:
Principle #26Copying

Solution Approach 2:

The patent replaces the mechanical/physical test processing method with an electrical measurement and modeling approach. By substituting the physical plasma-wafer interaction with electrical property measurements and mathematical modeling, the system achieves readiness assessment without consuming test wafers or generating actual plasma.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Loss of energy

If electrical property values are compared with fingerprints to determine readiness, then resource consumption is reduced, but false positive alarms increase due to power delivery system issues

Engineering Contradiction:
Improveplasma generation resource consumptionVSAvoidreadiness determination accuracy
Core Design Contradiction:
Loss of energyVSReliability

Solution Approach 1:

The patent segments the plasma processing system into distinct electrical components (power delivery system, matching network, plasma chamber, etc.) and creates separate electrical model parameters for each. This segmentation allows identification of which specific component causes deviations, enabling differentiation between power delivery issues and actual chamber problems, thereby reducing false positives.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent introduces an electrical model as an intermediary between raw electrical measurements and readiness determination. The model parameters serve as a mediator that translates electrical property variations into meaningful diagnostic information, filtering out noise from power delivery fluctuations and highlighting actual chamber issues.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Measurement precision

If conventional plasma-based testing is performed, then system readiness can be determined, but production time and manufacturing yield are negatively affected

Engineering Contradiction:
Improvereadiness determination capabilityVSAvoidproduction time efficiency
Core Design Contradiction:
Measurement precisionVSProductivity

Solution Approach 1:

The patent performs preliminary electrical measurements and model comparisons that can be completed quickly without initiating plasma generation. By conducting the diagnostic assessment before committing resources to plasma-based testing, the system determines readiness in advance, avoiding unnecessary plasma generation and associated production delays.

Inventive Principle:
Principle #10Preliminary action

Data Source

PatentUS8650002B2Determining plasma processing system readiness without generating plasma
Publication Date: 2014.02.11 LAM RES CORP
  • US8650002B2 patent drawing
  • US8650002B2 patent drawing
  • US8650002B2 patent drawing

AI summary

A test system for facilitating determining whether a plasma processing system (which includes a plasma processing chamber) is ready for processing wafers. The test system may include a computer-readable medium storing at least a test program. The test program may include code for receiving electric parameter values derived from signals detected by at least one sensor when no plasma is present in the plasma processing chamber. The test program may also include code for generating electric model parameter values using the electric parameter values and a mathematical model. The test program may also include code for comparing the electric model parameter values with baseline model parameter value information. The test program may also include code for determining readiness of the plasma processing system based on the comparison. The test system may also include circuit hardware for performing one or more tasks associated with the test program.