Plasma Chamber Temperature Control for Step Transitions
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In plasma processing, substantial temperature stabilization wait times occur due to significant differences in temperature settings between successive steps, leading to degraded operating rates and throughput in plasma processing apparatuses.
Innovation Solution
Implementing a temperature control method that includes a first temperature control, where the temperature is set for the next process upon completion of the current process, and a second temperature control, where the temperature is set in parallel with the entry or exit processes, to reduce stabilization wait times.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the temperature is controlled to the temperature setting of the next process after the current process is completed, then the temperature control is simple and reliable, but the temperature stabilization wait time increases and productivity decreases
Solution Approach 1:
The temperature is controlled to the temperature setting of the next process in parallel with the entry process or exit process, before the current process is actually completed. This preliminary temperature adjustment eliminates the temperature stabilization wait time that would otherwise occur between processes, thereby improving productivity while maintaining temperature control reliability.
2Manufacturing precision
If the temperature setting is changed for each step in a plasma process, then the processing quality is improved, but the temperature stabilization wait time increases and operating rate decreases
Solution Approach 1:
The temperature is adjusted to the next process's temperature setting during the entry process or exit process of the current process, rather than waiting until the current process completes. This preliminary action maintains the temperature precision needed for processing quality while eliminating the idle stabilization wait time between steps.
Solution Approach 2:
The temperature control operates continuously without interruption by performing the temperature adjustment in parallel with the entry process or exit process. This continuous operation ensures both processing quality through proper temperature settings and eliminates downtime through uninterrupted temperature stabilization.
Data Source
AI summary
A temperature control method is provided for controlling a plasma processing apparatus that is capable of changing a temperature setting for each step of a plasma process including multiple steps. The method includes a transfer step of performing an entry process for transferring a workpiece into a processing chamber of the plasma processing apparatus and/or an exit process for transferring the workpiece out of the processing chamber, a process execution step of executing the plasma process including multiple steps, and a temperature control step of performing a first temperature control and/or a second temperature control. The first temperature control includes controlling a temperature to a temperature setting of a next process according to a time execution of the plasma process is completed, and the second temperature control includes controlling the temperature to the temperature setting of the next process in parallel with the entry process and/or the exit process.