Plasma Container Coating Gas Buffering for Faster Gas Exchange
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Solution Overview
Problem
Existing plasma treatment devices for containers face challenges in shortening the gas exchange phase, leading to reduced production rates due to longer coating times required for stable pressure conditions and potential backpressure differences between process steps.
Innovation Solution
Incorporating throttles in the process gas lines, specifically between the process gas valve and the plasma chamber, creates a buffer volume that accelerates gas exchange by increasing dynamic pressure and reducing backmixing, allowing for better coatings at higher machine speeds with minimal modifications to existing devices.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the process gas valve is opened for a new coating process, then the gas exchange should be accelerated, but the back pressure differences between process steps cause longer gas exchange phases and reduced production rates
Solution Approach 1:
The buffer volume is pre-filled with process gas before the actual coating process begins. This preliminary accumulation of gas in the buffer volume between the process gas valve and throttle allows for immediate gas exchange when the valve opens, eliminating the need for lengthy gas exchange phases during process transitions and thereby increasing production rate
2Loss of time
If the buffer volume is increased to accelerate gas exchange, then the gas exchange phase is shortened, but the device complexity increases
Solution Approach 1:
A throttle component is introduced as an intermediary element in the process gas line. This throttle creates a naturally formed buffer volume in the space between the process gas valve and the throttle itself, eliminating the need for separate buffer tanks or complex gas storage systems while still achieving the desired gas exchange acceleration effect
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively shortens the gas exchange phase, reduces backmixing of process gases, and enables higher production rates without compromising coating quality, while ensuring explosion protection and efficient gas distribution.
Implementation Method 1
a buffer volume of process gas is present in the space between the process gas valve and the throttle. This means that when the process gas valve is opened for a new coating process, the buffer volume of process gas accelerates the process gas exchange in the shared central process gas line
Data Source
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AI summary
The invention relates to a device for the plasma treatment of containers (5), comprising a process gas generator (100) for generating a process gas mixture and comprising at least one plasma station (3), which comprises at least one plasma chamber (17) having a treatment position (40), in which plasma chamber at least one container (5) having a container interior (5.1) can be inserted and positioned in the treatment position (40), each plasma chamber (17) being at least partially evacuable in order to suck the process gas provided by the process gas generator (100) through the container (5), the interior of the container thus being provided with an inner coating by way of plasma treatment, and a throttle (81.2, 82.2, 83) is provided in at least one process gas duct (81, 82, 83) on the side of the associated process gas valve (81.1, 82.1, 83.1) facing away from the plasma chamber (17) and at a buffer distance to the process gas valve (81.1, 82.1, 83.1) that can be separately defined. The invention also relates to method for the plasma treatment of containers (5) in a plasma treatment device, wherein the process gas buffer is produced by a process gas valve (81.1, 82.1, 83.1) associated with the respective process gas and the dynamic pressure of this process gas is increased upstream of the process gas valve (81.1, 82.1, 83.1) associated therewith.