Plasma Coating Station Pulse Distribution for Independent Operation

The patent combines multiple coating stations into a single vacuum chamber and supplies them with a common power supply unit. This merging approach allows simultaneous operation of multiple stations (improving productivity) while reducing the number of power supplies needed (reducing device complexity and costs). The stations share common infrastructure including vacuum pumping and power supply, eliminating the need for separate systems at each station.

The patent implements periodic, time-multiplexed plasma pulsing where each coating station receives plasma pulses in sequence rather than simultaneously. The control unit coordinates the timing so that stations are pulsed alternately with sufficient pause periods between them. This periodic action allows multiple stations to operate efficiently within the same vacuum chamber while preventing plasma interference and ensuring stable, reliable coating processes at each station.

The patent makes the single power supply unit universal by enabling it to supply plasma pulses to multiple different coating stations through time-multiplexed control. The power supply can be dynamically assigned to different stations based on process requirements, providing adaptability and independence for each station's coating process while sharing the same energy source. This multi-functional approach reduces total energy consumption compared to having dedicated power supplies for each station.