Plasma Processing Condition Prediction Using Dual Signal Diagnostics
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Solution Overview
Problem
Current plasma processing apparatuses face challenges in accurately detecting abnormalities and predicting maintenance needs due to increased complexity and variability in semiconductor device production, leading to decreased detection accuracy and increased false information.
Innovation Solution
A plasma processing apparatus and method that utilize multiple abnormality determination algorithms, considering the appropriateness of each algorithm, to predict the state of the apparatus by analyzing first and second soundness index values from emission and electrical signal data, respectively, and determining abnormality based on thresholds set by these algorithms.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If multiple abnormality determination algorithms are used to improve detection accuracy, then the reliability of abnormality detection is improved, but the device complexity increases
Solution Approach 1:
The abnormality determination system is segmented into multiple independent algorithms (first algorithm and second algorithm) that operate in parallel. Each algorithm processes the same apparatus signal data independently and generates its own determination result. This segmentation allows the system to improve reliability through multiple perspectives while keeping each individual algorithm relatively simple and manageable.
Solution Approach 2:
The results from multiple independent algorithms are merged through a determination unit that integrates their outputs. The system combines the determination results from the first algorithm and the second algorithm to reach a final abnormality determination, thereby leveraging the strengths of multiple approaches while maintaining individual algorithm simplicity.
2Measurement precision
If multiple algorithms are applied to increase detection accuracy, then false information increases, but the measurement precision improves
Solution Approach 1:
The system implements feedback through the determination unit that receives and evaluates results from multiple algorithms. By comparing and integrating the determination results from different algorithms, the system can identify and filter out false positives, thereby reducing false information while maintaining high measurement precision through the collective wisdom of multiple algorithms.
Data Source
AI summary
A system that predicts an apparatus state of a plasma processing apparatus including a processing chamber in which a sample is processed is configured to have a data recording unit that records emission data of plasma during processing of the sample and electrical signal data obtained from the apparatus during the plasma processing, an arithmetic unit that includes a first calculation unit for calculating a first soundness index value of the plasma processing apparatus and a first threshold for an abnormality determination using a first algorithm with respect to the recorded emission data and a second calculation unit for calculating a second soundness index value of the plasma processing apparatus and a second threshold for the abnormality determination using a second algorithm with respect to the electrical signal data recorded in the data recording unit, and a determination unit that determines soundness of the plasma processing apparatus using the calculated first soundness index value and the first threshold and the calculated second soundness index value and the second threshold.