Plasma Confinement Apparatus With Segmented Electrical Field Shielding
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Solution Overview
Problem
Existing plasma confinement methods in semiconductor processing fail to completely prevent plasma leakage and secondary radio frequency discharges, leading to contamination and reduced performance in plasma processing chambers.
Innovation Solution
A plasma confinement apparatus with electrically insulating components and conductive components that form an electrical field shielding, featuring narrow passageways to quench charged species while allowing neutral species to pass through, effectively confining plasma within the processing region and reducing stray electrical fields.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If magnetic field is strengthened to confine plasma, then plasma diffusion is inhibited, but electrically sensitive components on semiconductor substrates may be damaged
Solution Approach 1:
The patent introduces an intermediate electromagnetic shielding structure consisting of conductive plates and insulating spacers positioned between the plasma source and the semiconductor substrate. This intermediary structure blocks stray electromagnetic fields and plasma particles from reaching sensitive components while allowing the magnetic field to maintain plasma confinement, thus resolving the contradiction between confinement effectiveness and component safety
Solution Approach 2:
The shielding structure is segmented into multiple conductive plates separated by insulating spacers, creating a distributed electromagnetic shield. This segmentation allows the structure to effectively block electromagnetic fields and plasma particles through multiple stages, reducing the risk to sensitive components while maintaining plasma confinement in the processing region
2Object-affected harmful factors
If magnetic field is weakened to protect components, then plasma diffusion cannot be effectively confined, but contamination is generated
Solution Approach 1:
The electromagnetic shielding structure acts as an intermediary barrier that captures and redirects plasma particles and electromagnetic fields away from sensitive components. This allows the magnetic field to be weakened for component protection while the shield prevents contamination, resolving the contradiction between component safety and contamination prevention
Solution Approach 2:
The shielding structure converts potentially harmful stray plasma particles and electromagnetic fields into a beneficial containment mechanism. By providing a designated path for these particles to follow (along the shield surfaces), the structure prevents uncontrolled plasma diffusion and contamination while maintaining effective plasma confinement in the processing region
3Reliability
If quartz rings are used to confine plasma, then charged particles are substantially confined, but electromagnetic waves and secondary radio frequency discharges cannot be completely prevented
Solution Approach 1:
The patent employs a composite shielding structure combining conductive materials (for electromagnetic wave blocking) with insulating materials (for electrical isolation). This composite approach simultaneously addresses charged particle confinement, electromagnetic wave shielding, and prevention of secondary radio frequency discharges, resolving the limitations of using quartz rings alone
Solution Approach 2:
The shielding structure is divided into multiple conductive plates separated by insulating spacers, creating a segmented electromagnetic shield. This segmentation effectively blocks electromagnetic waves and prevents continuous radio frequency discharge paths while maintaining charged particle confinement, overcoming the limitations of solid quartz ring structures
4Object-generated harmful factors
If plasma is not confined within processing region, then charged particles collide with unprotected regions causing contamination, but confinement structures increase device complexity
Solution Approach 1:
The electromagnetic shielding structure serves multiple functions simultaneously: it confines plasma particles, shields electromagnetic waves, protects sensitive components, and prevents chamber contamination. This multi-functionality reduces the need for separate confinement structures, thereby decreasing overall device complexity while achieving comprehensive plasma control and contamination prevention
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus significantly reduces plasma leakage and secondary plasma generation, maintaining high processing chamber performance and preventing contamination, thereby extending the lifespan of chamber components and improving semiconductor processing quality.
Implementation Method 1
at least one electrically conductive and grounded component which forms an electrical field shielding for the processing region
Implementation Method 2
the plurality of passageways are sized so as to quench the charged species and allow the neutral species to pass therethrough
Data Source
AI summary
A plasma confinement apparatus, and method for confining a plasma are described and which includes, in one form of the invention, a plurality of electrically insulated components which are disposed in predetermined spaced relation, one relative to the others, and surrounding a processing region of a plasma processing apparatus, and wherein a plurality of passageways are defined between the respective insulated components; and at least one electrically conductive and grounded component forms an electrical field shielding for the processing region.