Plasma Processing Control with Simulator-Based Parameter Tuning
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Solution Overview
Problem
Existing processing apparatuses face challenges in stably igniting plasma due to varying impedance and optimal matching circuit constants, which require numerous experiments to adjust for each apparatus and operational state, making it difficult to control the internal state effectively.
Innovation Solution
A control system that includes a specifying part, simulator, first and second control signal generation parts, and adjustment parts to adjust model and control parameters based on measurement values, allowing for stable plasma ignition by iteratively refining control signals and parameters to match target states.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the constant of the matching circuit is changed to stably ignite plasma, then plasma ignition stability is improved, but the time and experiments required to adjust the constant increase
Solution Approach 1:
The patent applies preliminary action by pre-calculating and storing optimal matching circuit constants for various operational conditions in a database before actual plasma processing. When plasma ignition is needed, the system simply retrieves the pre-determined constant based on current conditions (gas type, pressure, power), eliminating the need for time-consuming real-time experimentation and achieving stable ignition immediately.
Solution Approach 2:
The patent replaces the mechanical trial-and-error adjustment process with an automated information processing system. A computer calculates optimal constants using stored plasma characteristics data, stores these in a database, and automatically retrieves them during operation. This substitutes manual experimentation with automated computational methods, dramatically reducing adjustment time while maintaining ignition stability.
2Reliability
If the matching circuit constant is adjusted for each apparatus configuration, then plasma ignition reliability is improved, but the complexity of operation increases
Solution Approach 1:
The system applies self-service by automatically selecting and adjusting the optimal matching circuit constant without requiring operator intervention. The computer monitors operational conditions, retrieves the appropriate constant from the database, and automatically configures the matching circuit. This eliminates the need for operators to understand complex impedance matching principles or perform manual adjustments, making the system easy to operate while maintaining high ignition reliability.
Solution Approach 2:
The patent implements feedback by continuously monitoring plasma ignition status and operational conditions, then using this information to automatically select the optimal matching circuit constant from the database. The system adjusts the matching circuit based on real-time feedback about plasma state and processing conditions, ensuring reliable ignition while removing the burden of manual adjustment from the operator.
3Reliability
If extensive experimentation is conducted to determine optimal matching constants, then plasma ignition stability is improved, but productivity decreases
Solution Approach 1:
The patent performs the experimentation work in advance by pre-calculating optimal matching constants for various gas types, pressures, and power levels during system setup or maintenance periods. These pre-determined constants are stored in a database for rapid retrieval during actual production. This separates the research phase from the production phase, allowing extensive experimentation to be done beforehand without impacting ongoing processing throughput.
Solution Approach 2:
The system dynamically adapts to changing operational conditions by automatically retrieving the appropriate pre-calculated matching constant from the database based on current gas type, pressure, and power settings. This dynamic selection ensures optimal plasma ignition stability for each specific condition without requiring real-time experimentation, maintaining high productivity while adapting to varying production requirements.
Data Source
AI summary
A control system includes: a specifying part for specifying a model corresponding to a processing apparatus and a control algorithm that generates a control signal for controlling the processing apparatus; a simulator for simulating the state of the processing apparatus with the model; a first control signal generation part for generating a control signal based on the measurement value by using the control algorithm; a second control signal generation part for generating a control signal based on an output value of the simulator by using the control algorithm; a first adjustment part for adjusting a value of a model parameter included in the model; and a second adjustment part for adjusting a value of a control parameter included in the control algorithm so that an evaluation value calculated for the output value of the simulator becomes closer to a target value.


