Plasma Processing Apparatus Conveying Unit Alignment Integration

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

The existing plasma processing apparatuses require separate chambers for alignment, plasma processing, and conveying units, leading to increased size and installation area requirements.

Innovation Solution

Integration of a preparatory stage within the conveying unit for preliminary processing, such as alignment, eliminates the need for a dedicated chamber, allowing for a compact design by performing preliminary processing before conveying substrates to the plasma processing unit.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a separate alignment unit is provided as a chamber independent from the plasma processing unit, stock unit, and conveying unit, then the alignment function is achieved, but the apparatus size and installation area increase

Engineering Contradiction:
Improvealignment precisionVSAvoidinstallation area
Core Design Contradiction:
Manufacturing precisionVSArea of stationary object

Solution Approach 1:

The patent integrates the alignment unit into the conveying unit, merging two previously separate chambers into one. The preparatory stage for alignment is positioned within the conveying chamber, allowing the conveying apparatus to perform both conveying and alignment functions. This integration eliminates the need for a separate alignment chamber, thereby reducing the overall apparatus size and installation area while maintaining alignment precision.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The conveying unit is designed to serve multiple functions: it not only conveys substrates between the stock unit and plasma processing unit but also performs alignment operations through the integrated preparatory stage. This multi-functionality reduces the number of dedicated chambers needed, contributing to a more compact apparatus configuration.

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Reliability

If at least four chambers are provided (plasma processing unit, stock unit, conveying unit, and alignment unit), then the plasma processing function is achieved, but the apparatus size increases

Engineering Contradiction:
Improveplasma processing reliabilityVSAvoidapparatus volume
Core Design Contradiction:
ReliabilityVSVolume of stationary object

Solution Approach 1:

The patent combines the alignment unit and conveying unit into a single chamber space. The preparatory stage for alignment is arranged within the conveying chamber, allowing the same physical space to accommodate both alignment and conveying operations. This merging reduces the total number of separate chambers from four to three, thereby reducing apparatus volume while maintaining plasma processing reliability.

Inventive Principle:
Principle #5Merging (Combining)

3Ease of manufacture

If a dedicated chamber is provided for preliminary processing, then the preliminary processing function is achieved, but the apparatus complexity and size increase

Engineering Contradiction:
Improvepreliminary processing capabilityVSAvoidchamber configuration complexity
Core Design Contradiction:
Ease of manufactureVSDevice complexity

Solution Approach 1:

The preparatory stage for preliminary processing is integrated into the conveying unit rather than being housed in a separate dedicated chamber. This merging allows the conveying apparatus to perform both conveying and preliminary processing functions, reducing the number of separate chambers and simplifying the overall chamber configuration while maintaining full preliminary processing capability.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The conveying unit is designed with multi-functionality, serving as both a conveying mechanism and a housing for the preparatory stage that performs preliminary processing. This universal design reduces apparatus complexity by eliminating the need for dedicated chambers for each function, while still providing complete preliminary processing capabilities.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentUS8945411B2Plasma processing apparatus and plasma processing method
Publication Date: 2015.02.03 PANASONIC HOLDINGS CORP
  • US8945411B2 patent drawing
  • US8945411B2 patent drawing
  • US8945411B2 patent drawing

AI summary

The present invention is to achieve a reduction both in size of a plasma processing apparatus and an installation area thereof. A dry etching apparatus includes a stock unit that includes a cassette storing a tray that can be conveyed and that stores substrates. In a conveying unit storing a conveying apparatus of the tray, a rotary stage is provided. Rotational angular position adjustment of the tray is performed by rotating the rotary stage placed on the tray before being subjected to dry etching and detecting a notch by a notch detecting sensor.