Plasma Device for Low-Temperature Composite Film Deposition
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Solution Overview
Problem
Existing methods for depositing composite functional films with crystalline metal oxide particles are unsuitable for heat-sensitive substrates, as they require high temperatures and are not adaptable for one-step, low-temperature deposition at atmospheric pressure.
Innovation Solution
A plasma device and method that produce a plasma at atmospheric pressure, allowing for the simultaneous injection of metal oxide and matrix precursors in a post-discharge area to form a functional composite film with crystalline particles embedded in a matrix, suitable for heat-sensitive substrates, using spatially separated but simultaneous injections of precursors.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If flame spray pyrolysis or atmospheric pressure blown arc discharge is used to deposit composite functional films, then crystalline metal oxide particles can be formed, but the substrate temperature becomes too high for heat-sensitive substrates
Solution Approach 1:
The patent segments the precursor injection into two spatially separated injections: first metal oxide precursor injected at position closer to discharge area, then matrix precursor injected downstream. This segmentation allows independent control of crystallization conditions and substrate exposure temperature, enabling crystalline particle formation without overheating the substrate
Solution Approach 2:
The metal oxide precursor is injected and processed in the plasma field before the substrate is exposed to the deposition flux. The crystalline particles are formed preliminarily in the plasma, then transported to deposit on the substrate at lower temperature, separating the high-temperature crystallization step from the low-temperature deposition step
2Manufacturing precision
If conventional deposition methods are used, then crystalline metal oxide particles can be deposited, but the process requires multiple steps and cannot be performed at low temperature in one step
Solution Approach 1:
The patent merges multiple deposition steps into a single continuous process by implementing two sequential precursor injections within one plasma discharge cycle. The metal oxide precursor forms crystalline particles, then the matrix precursor embeds them in situ, achieving both particle formation and composite film deposition in one step rather than requiring separate processing steps
Solution Approach 2:
The invention directly deposits composite functional films with metal oxide crystalline particles embedded in a matrix material through simultaneous dual precursor injection. This approach creates true composite materials in a single deposition process, avoiding the need for separate particle synthesis and film formation steps
3Ease of manufacture
If single precursor injection is used, then the process is simple, but composite functional films with metal oxide particles embedded in matrix cannot be formed
Solution Approach 1:
The precursor injection is segmented into two distinct injections: metal oxide precursor and matrix precursor, injected at different positions and times within the plasma field. This segmentation enables the formation of composite functional films with embedded crystalline particles while maintaining a relatively simple single-step deposition process
Solution Approach 2:
The plasma field acts as an intermediary that processes both precursors sequentially. The metal oxide precursor is first activated and crystallized in the plasma, then the matrix precursor is introduced and embeds the particles, with the plasma mediating both transformations in a coordinated manner
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables one-step, low-temperature deposition of high-quality composite films on heat-sensitive substrates like polymers and glass, maintaining substrate integrity and retaining photocatalytic activity, while providing mechanical stability and superhydrophilic properties.
Implementation Method 1
a discharge area configured to electrically excite the gas in the conduit at the inlet in order to produce a plasma at atmospheric pressure
Implementation Method 2
The invention is also directed to a plasma-enhanced chemical vapour deposition method, as defined in claim 7, for depositing a functional composite film on a substrate
Implementation Method 3
depositing a functional composite film comprising crystallized particles embedded in a matrix
Data Source
Figure 1~2
Figure 3a~6b
Figure 4a~5b
AI summary
Plasma device (2) for depositing a functional composite film on a substrate (4) at atmospheric pressure, said device comprising a conduit (6) extending along a longitudinal axis with a gas inlet (8); a discharge area (12) configured to electrically excite the gas in the conduit at the inlet in order to produce a plasma at atmospheric pressure; a post-discharge area (14) downstream of the discharge area, comprising at least one first inlet (20) through a wall of the conduit, for injecting a first precursor or precursors mixture in the plasma; a plasma outlet (10). The post-discharge area further comprises at least one second inlet (22) through the wall of the conduit, for injecting a second precursor or precursors mixture in the plasma downstream of the at least first inlet.