Plasma Device With Dielectric Barrier For Workpiece Protection
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Solution Overview
Problem
Current plasma technologies face limitations in safely processing electrically conductive workpieces due to high electric fields and currents, and remote type plasma technologies often result in reduced plasma energy delivery.
Innovation Solution
A plasma device design incorporating a dielectric barrier, multiple electrode structures, and a specific voltage application method to generate and direct plasma energy effectively, minimizing damage to workpieces while maintaining plasma energy efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If direct type plasma technology is used to expose a workpiece in an electric field, then plasma processing effectiveness is improved, but the high electric field and current may cause damage to electrically conductive workpieces
Solution Approach 1:
A dielectric barrier is introduced as an intermediary between the plasma generation region and the workpiece. This dielectric barrier shields the workpiece from direct exposure to high electric fields and currents while still allowing plasma to be generated and directed toward the workpiece surface for effective processing.
Solution Approach 2:
The plasma device is segmented into distinct functional regions: a plasma generation region with electrodes for creating plasma, a dielectric barrier region for shielding, and a processing region where plasma interacts with the workpiece. This segmentation allows independent optimization of plasma generation and workpiece protection.
2Object-affected harmful factors
If remote type plasma technology is used to shield the electric field with grounded metal, then workpiece damage is avoided, but plasma energy is reduced during travel to the workpiece
Solution Approach 1:
The dielectric barrier serves as a non-conductive intermediary that differs from traditional grounded metal shields. It provides electrical isolation while allowing plasma to maintain its energy as it travels through the controlled environment toward the workpiece, avoiding the energy loss associated with metal shielding.
Solution Approach 2:
The dielectric barrier changes the electrical parameters of the plasma environment by providing insulation rather than grounding. This maintains higher plasma potential and energy levels during transport compared to remote plasma with metal shielding, while still protecting the workpiece from damaging electric fields.
3Reliability
If multiple electrode structures are added to control plasma generation and delivery, then plasma processing safety and effectiveness are improved, but device complexity increases
Solution Approach 1:
The device is divided into functionally distinct electrode structures: first electrodes for plasma generation, second electrodes for plasma control, and third electrodes for plasma delivery control. Each segment performs a specific function, making the complex system more manageable and maintainable while improving overall reliability.
Solution Approach 2:
Different electrode structures are positioned at different locations with different electrical properties tailored to local requirements. The first electrodes generate plasma with specific characteristics, the second electrodes control plasma distribution, and the third electrodes manage plasma delivery to the workpiece, optimizing performance at each stage.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables safe and efficient plasma processing of workpieces by controlling plasma generation and delivery, avoiding damage and ensuring effective energy transfer, thus overcoming the limitations of existing technologies.
Implementation Method 1
The plasma technology has been extensively used in various industries... direct type or remote type plasma technology
Implementation Method 2
exposes a workpiece in an electric field to cause direct contact between the workpiece and the plasma
Data Source
AI summary
A plasma device includes a dielectric barrier, a first electrode structure, a second electrode structure, and a third electrode structure. The dielectric barrier has an upstream terminal and a downstream terminal and defines a space, in which the first electrode structure is disposed. A gap with multiple widths is formed between the first electrode structure and the dielectric barrier. The dielectric barrier is located between the first electrode structure and the second electrode structure. The second electrode structure includes electrode blocks sequentially arranged from the upstream terminal to the downstream terminal. The dielectric barrier, the first electrode structure, and the second electrode structure are located on the same side of the third electrode structure located at the downstream terminal. A minimum distance between the electrode blocks and the third electrode structure is not less than a distance between the first electrode structure and the third electrode structure.