Plasma Processing Apparatus Dividing Wall Gap Adjustment

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Solution Overview

Problem

Plasma processing apparatuses face challenges in generating high-density plasma over a wide area for large workpieces, and the window member dividing the gas space in cylindrical members is prone to thermal deformation, leading to gap instability and potential damage.

Innovation Solution

A plasma processing apparatus with a cylindrical member and a dividing wall that separates from the rotator, featuring an adjustment opening to control plasma processing range, and a cooling system to prevent thermal deformation, ensuring precise gap adjustment and maintaining the integrity of the window member.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Quantity of substance

If a cylindrical electrode is used to generate plasma for film processing, then plasma can be generated in the chamber, but it is difficult to generate high-density plasma in a wide range

Engineering Contradiction:
Improveplasma densityVSAvoidplasma generation area
Core Design Contradiction:
Quantity of substanceVSArea of stationary object

Solution Approach 1:

The invention divides the plasma generation system into two independent parts: a cylindrical electrode for generating high-density plasma in a localized region, and a separate antenna for generating plasma in a wide area. This segmentation allows each component to optimize its function without compromising the other, resolving the contradiction between plasma density and plasma generation area.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The invention merges two different plasma generation methods (cylindrical electrode and antenna) into a single integrated system. The cylindrical electrode and antenna work together to provide both high-density plasma and wide-area plasma coverage, simultaneously achieving both improving and worsening features.

Inventive Principle:
Principle #5Merging (Combining)

2Device complexity

If the window member is directly attached to the cylindrical member, then the structure is simple, but the window member is prone to thermal deformation and potential damage

Engineering Contradiction:
Improvestructure complexityVSAvoidwindow member integrity
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The invention extracts the window member from direct contact with the cylindrical member that generates heat. By positioning the window member separately and using a non-contact support structure, the heat source is removed from the window member's environment, preventing thermal deformation while maintaining structural simplicity through the use of magnetic suspension or mechanical supports.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The invention introduces an intermediary support structure (such as a non-contact support using magnetic fields or a thermal isolation mechanism) between the cylindrical member and the window member. This intermediary protects the window member from thermal effects while maintaining the structural connection needed for the apparatus to function.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Device complexity

If the gap between the cylindrical member and the rotation table is fixed, then the structure is simple, but the gap cannot be precisely adjusted for optimal processing

Engineering Contradiction:
Improveadjustment mechanism complexityVSAvoidgap precision
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The invention transforms the fixed gap structure into a dynamic, adjustable gap structure. The support mechanism for the cylindrical member is designed to allow precise adjustment of the gap distance, enabling optimization of plasma processing parameters while maintaining operational flexibility.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The invention may replace complex mechanical adjustment mechanisms with alternative systems such as magnetic positioning or computer-controlled actuation, reducing mechanical complexity while achieving precise gap adjustment capability.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively prevents thermal deformation of the window member and allows precise adjustment of the gap between the cylindrical member and the workpiece, ensuring stable plasma generation and processing efficiency for large workpieces.

Implementation Method 1

By applying a high frequency voltage to the antenna, plasma is generated in the gas space by inductive coupling

Methodology Applied
Scientific EffectInductive coupling: Electromagnetic Induction

Implementation Method 2

a cooling system to prevent thermal deformation

Methodology Applied
Scientific EffectThermal conduction: Conduction (thermal)

Data Source

PatentUS11127574B2Plasma processing apparatus
Publication Date: 2021.09.21 SHIBAURA MECHATRONICS CORP
  • US11127574B2 patent drawing
  • US11127574B2 patent drawing
  • US11127574B2 patent drawing

AI summary

A plasma processing apparatus includes a conveyance unit that has a rotator in a vacuum container, and circulating carries a workpiece by the rotator along a circular conveyance path, a cylindrical member extended in a direction toward the conveyance path in the vacuum container, a window member that divides a gas space where a process gas is introduced and an exterior, and an antenna causing the process gas to generate inductive coupling plasma for plasma processing when power is applied. The cylindrical member is provided with an opposing part with the opening and faces the rotator, a dividing wall is provided between the opposing part and the rotator so as not to contact the opposing part and the rotator and not to move relative to the vacuum container, and the dividing wall is provided with an adjustment opening that faces the opening, and adjusts a range of the plasma processing.