Plasma Dry Cleaning with Laser Substrate Heating

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Solution Overview

Problem

The dry cleaning process using a dry cleaning gas in vapor or gas phase state is inefficient at room temperature, leading to reduced productivity due to lower chemical reaction rates.

Innovation Solution

A dry cleaning apparatus and method that includes a chamber with a plasma generator and a laser irradiator, where a dry cleaning gas is converted into plasma and a laser light is used to heat the substrate, increasing the chemical reaction rate by transitioning cleaning process by-products into a gaseous state.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If a dry cleaning gas in vapor phase or gas phase state is used at room temperature, then the chemical reaction rate is reduced, but the equipment stability is maintained

Engineering Contradiction:
Improvechemical reaction rateVSAvoidsubstrate temperature
Core Design Contradiction:
ProductivityVSTemperature

Solution Approach 1:

The patent applies parameter changes by transitioning the dry cleaning gas from vapor/gas phase to plasma phase, and by controlling substrate temperature through laser heating. This changes the physical and chemical parameters of the cleaning process to achieve higher reaction rates while maintaining equipment stability through precise temperature control.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent utilizes phase transitions by converting the dry cleaning gas into plasma state through the plasma generator. This phase transition from gas/vapor to plasma enables enhanced chemical reactivity and cleaning efficiency without requiring excessive temperature increases that would compromise equipment stability.

Inventive Principle:
Principle #36Phase transitions

2Productivity

If the chemical reaction rate is increased by heating the substrate, then the productivity is improved, but the energy consumption increases

Engineering Contradiction:
Improveprocess timeVSAvoidenergy consumption
Core Design Contradiction:
ProductivityVSUse of energy by moving object

Solution Approach 1:

The patent replaces conventional thermal heating mechanisms with laser irradiation and plasma generation. This substitution enables more efficient energy delivery directly to the substrate and cleaning gas, reducing overall energy consumption while achieving faster processing times and improved productivity.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent employs periodic action through controlled laser pulsing and plasma generation cycles. This allows for intermittent heating that achieves the necessary reaction rates while minimizing total energy consumption compared to continuous heating, thereby improving productivity with reduced energy input.

Inventive Principle:
Principle #19Periodic action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enhances the dry cleaning process by increasing the chemical reaction rate of the dry cleaning gas, reducing process time, and improving productivity while maintaining equipment stability and cleaning performance.

Implementation Method 1

a plasma generator generating plasma from the dry cleaning gas

Methodology Applied
Scientific EffectPlasma generation: Plasma

Implementation Method 2

a laser irradiator irradiating the laser light on the substrate through the optical window to heat the substrate

Methodology Applied
Scientific EffectLaser heating: Laser

Implementation Method 3

the shower head including an optical window transmitting a laser light therethrough toward the substrate support

Methodology Applied
Scientific EffectLight transmission: Light

Data Source

PatentUS11742221B2Dry cleaning apparatus and dry cleaning method
Publication Date: 2023.08.29 SAMSUNG ELECTRONICS CO LTD
  • US11742221B2 patent drawing
  • US11742221B2 patent drawing
  • US11742221B2 patent drawing

AI summary

A dry cleaning apparatus includes a chamber, a substrate support supporting a substrate within the chamber, a shower head arranged in an upper portion of the chamber to supply a dry cleaning gas toward the substrate, the shower head including an optical window transmitting a laser light therethrough toward the substrate support, a plasma generator generating plasma from the dry cleaning gas, and a laser irradiator irradiating the laser light on the substrate through the optical window and the plasma to heat the substrate.