Plasma Edge Control via Electrode Extensions
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Solution Overview
Problem
As the size of workpieces and process regions in plasma chambers increases, there is a growing need for precise control of plasma parameters, particularly at the plasma edge region, to ensure effective processing and prevent material deposition on workpieces.
Innovation Solution
A system and method for controlling the plasma edge region by adjusting the voltage amplitude of RF signals applied to the upper and lower electrode extensions, using a control circuit with active and passive components to manage the electric fields and plasma density, ensuring precise control of the plasma edge region.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If the size of workpiece and process region increases, then the processing capacity is improved, but the control precision of plasma parameters at the plasma edge region deteriorates
Solution Approach 1:
The electrode structure is segmented into a central electrode and multiple electrode extensions that protrude into the process region. This segmentation allows independent control of plasma parameters in different spatial zones, enabling precise control at the plasma edge region while maintaining a large overall process region area for high processing capacity.
Solution Approach 2:
The electrode extensions are positioned to specifically target and control the plasma edge region, creating locally optimized plasma conditions at the periphery while the central region maintains its processing characteristics. This local quality enhancement ensures precise plasma parameter control at the edge without compromising the overall process region size.
2Device complexity
If the plasma edge region is not properly controlled, then the device complexity is reduced, but material deposition on workpiece occurs
Solution Approach 1:
The electrode extensions are designed to preemptively control and confine the plasma edge region before materials can deposit on the workpiece. By establishing controlled plasma conditions at the edge region in advance, the system prevents harmful material deposition without requiring complex additional control systems or post-processing interventions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for precise control of plasma density and distribution, enhancing the efficiency of plasma processing by maintaining the plasma edge region's parameters, thereby improving the processing of workpieces without material deposition.
Implementation Method 1
A control circuit generates a radio frequency signal to create an electric field in the plasma edge region
Implementation Method 2
apply plasma excitation fields to a region of a vacuum chamber for plasma processing a workpiece
Data Source
AI summary
Systems and methods for controlling a plasma edge region are described. One of the systems includes a top electrode and a bottom electrode. The system also includes an upper electrode extension and a lower electrode extension. At least a portion of the plasma edge region is formed between the upper electrode extension and the lower electrode extension. The system includes a circuit to control a radio frequency signal at the upper electrode extension.