3D Restoration of Plasma Edge Rings for High-Power Etching
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Solution Overview
Problem
High-aspect ratio etching and miniaturization in plasma processing require efficient ion attraction, but existing methods face challenges in maintaining component integrity and efficiency, particularly in high-frequency power applications.
Innovation Solution
A plasma processing apparatus with a parallel-plate capacitively-coupled plasma configuration and a 3D printing system for restoring consumable components, using high-frequency power for plasma formation and bias voltage generation, along with a three-dimensional scanner for measuring consumption states, allows for precise control and restoration of components like the edge ring, extending their lifespan.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If high frequency power is supplied at high power level for ion attraction, then high aspect ratio etching and miniaturization are improved, but component consumption and damage increase
Solution Approach 1:
The patent applies the discarding and recovering principle by collecting consumed component particles from the plasma processing chamber and reusing them to restore consumed regions of components. The collection unit gathers particles that would otherwise be wasted, and the restoration unit uses these collected particles to replenish consumed component material, thereby extending component lifespan while maintaining high power plasma processing efficiency.
Solution Approach 2:
The patent changes the operational parameters by switching between high power mode (for efficient etching) and low power mode (for component restoration). The control unit manages power supply levels, using high frequency power at high power levels during etching operations and reducing power levels during component restoration phases, thus resolving the contradiction between etching efficiency and component integrity.
2Manufacturing precision
If high frequency power is supplied at high power level for ion attraction, then miniaturization is improved, but component lifespan decreases
Solution Approach 1:
The system recovers consumed component particles through the collection unit and restores them to consumed regions via the restoration unit. This recovery and restoration process extends component lifespan, allowing components to withstand prolonged high power plasma processing required for miniaturization without frequent replacements.
Solution Approach 2:
The component restoration system enables self-service by automatically collecting and restoring component particles without manual intervention. The collection unit gathers consumed particles and the restoration unit automatically deposits them back onto consumed regions, allowing the system to maintain components autonomously during continuous high power operation for miniaturization.
3Reliability
If components are frequently replaced due to consumption, then component integrity is maintained, but manufacturing lead time increases
Solution Approach 1:
Instead of discarding consumed components and replacing them with new ones, the system recovers consumed particles and restores them to extend component life. This eliminates frequent component replacements and the associated downtime, maintaining component integrity while significantly reducing manufacturing lead time.
Solution Approach 2:
The restoration system enables continuous operation by maintaining component integrity through automatic restoration. Rather than interrupting production for component replacements, the system continuously restores consumed regions, ensuring uninterrupted plasma processing and eliminating downtime associated with component changes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the efficiency of plasma processing by maintaining component integrity and extending the lifespan of consumable parts, reducing the need for frequent replacements and minimizing lead times in manufacturing.
Implementation Method 1
there is performed a plasma process in which a high frequency power for bias voltage generation is supplied at a high power level
Implementation Method 2
a 3D printing system for restoring consumable components
Data Source
AI summary
A forming method of a component used in a plasma processing apparatus includes irradiating an energy beam to a source material of the component while supplying the source material based on a surface state of the component.