Plasma Processing Electrode Charge Stabilization
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Solution Overview
Problem
Plasma processing devices face challenges in maintaining stable plasma discharge after prolonged periods of inactivity, leading to difficulties in resuming operations and achieving high-quality plasma processes.
Innovation Solution
A plasma processing device and operation method that include a charge storage process using high frequency power of lower output than the regular processing power, applied when the device has been inactive for a predetermined time, to stabilize plasma discharge and facilitate easy restart.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the plasma processing device stops operating for a long time, then the device can be maintained or moved, but plasma discharge cannot be easily caused when operation is resumed
Solution Approach 1:
The patent applies preliminary action by performing a charge storage process before the actual plasma processing when the device has been inactive for a predetermined time. This preliminary charge storage step prepares the electrode with sufficient electrical charge, ensuring that plasma discharge can be initiated smoothly when operation resumes, thus resolving the issue of difficult plasma ignition after long idle periods
Solution Approach 2:
The patent changes the operational parameters by switching between different high frequency power output levels. When the device is inactive for a long time, it transitions from normal processing power to a charge storage mode with different power parameters, allowing the electrode to accumulate necessary charge. This parameter change enables reliable plasma discharge initiation after idle periods
2Reliability
If high frequency power of lower output is supplied to the electrode, then plasma discharge can be stably caused after long inactivity, but the processing time increases due to additional charge storage process
Solution Approach 1:
The patent applies dynamics by making the charge storage process conditional rather than static. The control unit dynamically determines whether to perform charge storage based on the elapsed time since the previous plasma process. If the time exceeds a predetermined threshold, charge storage is performed; otherwise, it is skipped. This dynamic approach minimizes unnecessary time loss while ensuring plasma discharge stability when needed
3Adaptability or versatility
If the device is initially activated or resumed for maintenance, then the device can be put into service, but plasma discharge cannot be easily caused due to prolonged inactivity
Solution Approach 1:
The patent implements feedback by having the control unit continuously monitor the elapsed time since the previous plasma process. Based on this feedback information, the control unit automatically determines whether to initiate a charge storage process before allowing plasma processing. This feedback mechanism ensures that the device adapts to its operational history and maintains reliable plasma discharge regardless of idle periods
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables stable plasma discharge and maintenance of high-quality plasma processes even after long periods of inactivity, ensuring consistent performance and preventing defects in film deposition and other plasma processes.
Implementation Method 1
an electrode configured to generate at least one of an electric field and a magnetic field to be introduced inside the processing chamber to generate plasma from the plasma gas
Implementation Method 2
generating plasma discharge inside the chamber
Implementation Method 3
a high frequency power source configured to supply high frequency power to the electrode in a variable manner
Data Source
AI summary
An operation method of a plasma processing device, includes performing a plasma process on a workpiece by supplying first high frequency power of a predetermined output to an electrode and generating plasma; and performing a charge storage process before the plasma process when a time interval from an end of a previous operation of the plasma processing device exceeds a predetermined interval, the charge storage process including supplying, to the electrode, second high frequency power of a lower output than the predetermined output.