Plasma Electrode Choke Structure for Electromagnetic Wave Suppression
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Solution Overview
Problem
Existing plasma processing apparatuses face challenges in effectively suppressing the emission of electromagnetic waves from the plasma generation space to the processing space, which can lead to inefficient plasma utilization and substrate processing.
Innovation Solution
Incorporating a choke mechanism with a dielectric member that protrudes inside the chamber and is in contact with the peripheral edge of the second electrode, along with a conductor portion and a cavity, to create a high-impedance environment that suppresses electromagnetic wave emission through the use of radio-frequency waves and a specific waveguide configuration.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If a plasma generation space is provided between electrodes to generate plasma, then active species are produced for substrate processing, but electromagnetic waves are emitted from the plasma generation space to the processing space causing inefficient plasma utilization
Solution Approach 1:
A dielectric member is introduced as an intermediary component between the plasma generation space and the processing space. This dielectric member forms a choke structure that mediates the interaction between electromagnetic waves and the processing space, preventing harmful electromagnetic wave emission while allowing active species to pass through to the substrate for efficient plasma utilization
Solution Approach 2:
The choke structure converts the harmful electromagnetic wave emission into a beneficial configuration. By designing the dielectric member with specific dimensions and positioning it to form a choke, the structure that could potentially emit electromagnetic waves is transformed into an electromagnetic wave suppressor, turning a harmful effect into a useful function for confining plasma
2Power
If electromagnetic waves are emitted from the plasma generation space, then plasma is generated, but the emission to the processing space reduces plasma processing efficiency
Solution Approach 1:
The dielectric member is designed with non-uniform thickness, being thinner at the outer peripheral portion and thicker at the inner peripheral portion. This local quality variation creates different electromagnetic impedance characteristics in different regions, allowing the choke structure to effectively suppress electromagnetic waves while maintaining plasma generation power in the plasma generation space
Solution Approach 2:
The choke structure changes the electromagnetic parameters (impedance, wave propagation characteristics) in the interface region between the plasma generation space and processing space. By adjusting the dielectric member's dimensions and material properties, the electromagnetic wave emission is suppressed while plasma generation power is maintained, thereby improving substrate processing efficiency
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively reduces electromagnetic wave emission, ensuring that active species generated in the plasma generation space are efficiently guided into the processing space, enhancing the plasma processing efficiency and substrate treatment.
Implementation Method 1
a choke configured to suppress emission of electromagnetic waves from the plasma generation space to the processing space via the plurality of through holes, wherein the choke comprises a dielectric member
Implementation Method 2
an inlet portion configured to introduce electromagnetic waves into the plasma generation space; the second electrode is configured to provide a plasma generation space between the first electrode and the second electrode
Data Source
AI summary
A plasma processing apparatus includes a chamber having a sidewall and providing a processing space; a substrate support provided in the processing space; a first electrode provided above the processing space; a second electrode provided above the processing space and below the first electrode, wherein the second electrode is configured to provide a plasma generation space between the first electrode and the second electrode and provides a plurality of through holes that guide active species into the processing space; an inlet portion configured to introduce electromagnetic waves into the plasma generation space; and a choke configured to suppress emission of electromagnetic waves to the processing space via the plurality of through holes. The choke includes a dielectric member in contact with a bottom surface of a peripheral edge portion of the second electrode. The dielectric member protrudes inside the chamber.