Plasma Electrode Coating to Prevent Film Detachment Dust
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The detachment of deposition films from electrode surfaces during plasma-based film formation leads to dust generation, particularly when using high-stress films like WBC on aluminum electrodes, due to poor adhesiveness.
Innovation Solution
Forming a coat film made of aluminum fluoride on the electrode surfaces to enhance adhesiveness with the deposition film, preventing detachment and dust generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a deposition film is formed on an aluminum electrode using plasma, then the film formation process is completed, but the film detaches from the electrode surface causing dust generation
Solution Approach 1:
A coat film containing aluminum and fluorine or aluminum and oxygen is formed as an intermediary layer between the aluminum electrode and the deposition film. This intermediate coat film improves the adhesion between the electrode and deposition film, preventing detachment and dust generation while maintaining the plasma-based film formation process
2Reliability
If a coat film containing aluminum and fluorine or aluminum and oxygen is formed on the electrode surface, then adhesion between the deposition film and electrode is improved, but the process complexity increases
Solution Approach 1:
The coat film formation is merged with the existing plasma-based film formation process by using the same plasma generation mechanism. The plasma process that forms the deposition film also deposits the coat film containing aluminum and fluorine or aluminum and oxygen, combining multiple functions into a single integrated process step
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents dust generation by ensuring high adhesiveness between the deposition film and the electrode, maintaining process integrity and efficiency.
Implementation Method 1
The electrode generates plasma from gas supplied into the chamber to form a first film on the substrate by the plasma
Data Source
AI summary
A substrate processing apparatus includes a chamber to accommodate a substrate. The apparatus includes a stage to support the substrate in the chamber. The apparatus includes an electrode disposed above the stage and containing aluminum. The electrode generates plasma from gas supplied into the chamber to form a first film on the substrate by the plasma. The apparatus further includes a second film formed on a surface of the electrode and containing aluminum and fluorine or containing aluminum and oxygen.