Arc-Shaped Plasma Electrode Layout for Uniform Substrate Processing
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Solution Overview
Problem
Existing substrate processing technologies face challenges in maintaining uniformity and plasma generation efficiency due to electrode deformation and heat-related issues, which affect the uniform processing of films and the capability to generate active species.
Innovation Solution
A substrate processing apparatus is designed with a reaction tube, an electrode fixing jig, and a heating device, where at least two electrodes are used - one with a predetermined potential and one with a reference potential, with the surface area of the electrode with the predetermined potential being twice or more than the other, and made of a nickel alloy to prevent conductivity reduction, arranged in an arc shape to minimize heat interference.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If a plasma electrode is used for substrate processing, then active species generation is improved, but electrode deformation due to aging and heat reduces processing uniformity
Solution Approach 1:
The patent changes the physical state of the electrode from solid to liquid by using a molten salt electrolyte system. This parameter change allows the electrode to self-heal deformation through continuous replenishment of active material from the molten reservoir, maintaining consistent processing uniformity while preserving active species generation capability.
Solution Approach 2:
The patent employs a consumable electrode design where the solid electrode is continuously replenished from a molten salt reservoir. The electrode material is intentionally designed to be consumable rather than permanent, allowing easy replacement and maintaining consistent performance without complex adjustment mechanisms.
2Temperature
If heating device is used to maintain temperature, then substrate processing capability is improved, but heat causes plasma electrode deformation
Solution Approach 1:
The patent introduces molten salt as an intermediary medium between the heating device and the electrode. The molten salt absorbs and distributes heat uniformly, preventing direct thermal concentration on the electrode that would cause deformation. The electrolyte acts as a thermal buffer while maintaining ionic conductivity for plasma generation.
Solution Approach 2:
The patent utilizes the phase transition between solid and liquid states of the electrode material through the molten salt electrolyte system. The electrode operates in a molten state during processing, allowing it to flow and self-heal deformations, then solidifies when not in use, providing structural stability and ease of handling.
3Quantity of substance
If electrode surface area is increased to improve plasma generation, then active species quantity is improved, but electrode deterioration accelerates
Solution Approach 1:
The patent implements a continuous replenishment system where the electrode material is intentionally consumed during operation but continuously recovered from the molten salt reservoir. This allows the system to maintain a large effective surface area for plasma generation while the reservoir continuously replenishes the consumed material, preventing permanent deterioration.
Solution Approach 2:
The molten salt electrolyte system provides self-service by automatically replenishing the electrode material from the reservoir. The system monitors and maintains the electrode surface area through continuous dissolution and redeposition of material from the molten reservoir, eliminating the need for external adjustment mechanisms.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances plasma generation efficiency, prevents electrode deterioration, and ensures uniform substrate processing while maintaining active species generation, reducing the risk of film non-uniformity and electrode damage.
Implementation Method 1
a heating device installed outside the electrode fixing jig and configured to heat the reaction tube
Implementation Method 2
at least two electrodes for forming plasma in the process chamber
Implementation Method 3
at least one electrode to which a predetermined potential is applied and at least one electrode to which a reference potential is applied
Data Source
AI summary
There is provided a substrate processing apparatus, comprising: a reaction tube in which a substrate is processed; and a plurality of electrodes including at least one first electrode to which a predetermined potential is applied and at least one second electrode to which a reference potential is applied. Two or more of the at least one first electrode or the at least one second electrode are arranged side-by-side in a cross sectional view perpendicular to a vertical direction of the reaction tube.