Self-Aligning Electrode Assembly for Plasma Chamber Concentricity
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Solution Overview
Problem
Existing plasma processing apparatuses face challenges in maintaining concentricity between the upper and bottom electrode assemblies due to frequent opening and closing of the chamber lid, leading to position drift and non-uniform etching, which complicates the adjustment process and affects etching performance.
Innovation Solution
The apparatus incorporates self-alignment devices with upper and lower structures that facilitate easy alignment and adjustment of the movable upper electrode assembly with the bottom electrode assembly, allowing for concentricity without the need for complex realignment after chamber lid operations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If the chamber lid is frequently opened and closed for routine maintenance, then the accessibility for adjustment is improved, but the concentricity between the upper electrode assembly and the bottom electrode assembly deteriorates due to position drift
Solution Approach 1:
The self-alignment structures (aligning holes and guide pins) are pre-configured on the upper and bottom electrode assemblies before operation. These structures automatically guide the electrode assemblies into correct concentric alignment when the chamber lid is opened or closed, eliminating the need for manual realignment and preventing position drift during routine maintenance access.
2Manufacturing precision
If manual center realignment is performed after each chamber lid operation, then the concentricity is restored, but the adjustment time increases significantly
Solution Approach 1:
The upper and bottom electrode assemblies are equipped with self-alignment structures that automatically perform the alignment function without operator intervention. The guide pins fit into aligning holes to automatically establish correct concentric positioning, making the system self-aligning and eliminating time-consuming manual adjustment operations.
3Strength
If the upper electrode assembly is connected to the chamber lid, then the structural support is improved, but the position drift occurs due to repeated flipping and opening/closing operations
Solution Approach 1:
Self-alignment structures (aligning holes and guide pins) are pre-configured on both the upper electrode assembly and bottom electrode assembly to automatically restore correct positioning after any movement or disturbance, preventing cumulative position drift while maintaining structural support through the chamber lid connection.
Data Source
AI summary
Disclosed are a plasma processing apparatus and an adjusting method of the same. The apparatus includes: a vacuum chamber enclosed by a chamber body and a chamber lid; a movable upper electrode assembly disposed in the vacuum chamber; a bottom electrode assembly, arranged opposite the movable upper electrode assembly, the bottom electrode assembling being detachably connected with the bottom of the chamber body; a plurality of self-alignment devices each including a self-alignment upper structure and a self-alignment lower structure, the self-alignment upper structure and the self-alignment lower structure being connected to the movable upper electrode assembly and the bottom electrode assembly, respectively, wherein when the self-alignment upper structures and the self-alignment bottom structures are aligned to be jointed together, the center of the movable upper electrode assembly is aligned with that of the bottom electrode assembly. The disclosure offers the following advantages: through cooperation between the self-alignment upper structures and the self-alignment lower structures, the plasma processing apparatus realizes concentricity adjustment between the movable upper electrode assembly and the lower electrode assembly, rendering the self-alignment devices simple in structure and convenient to operate and alleviating testing pressures on operators.