Multi-Region Plasma Electrode Structure for Substrate Processing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing substrate processing apparatuses lack the ability to differentiate between regions that generate plasma and those that do not, leading to reduced efficiency in substrate processing.
Innovation Solution
The apparatus includes a chamber with a first electrode, a second electrode with multiple openings, protrusion electrodes connecting the first electrode to the openings, and a substrate supporter. This configuration allows for the generation of plasma in specific discharging regions based on process conditions, preventing plasma generation in regions that require none.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If plasma is generated in all regions between electrodes, then processing coverage is improved, but radical loss and energy waste increase in non-required regions
Solution Approach 1:
The processing space is segmented into multiple discharging regions (first, second, third, and fourth discharging regions) with different plasma generation characteristics. The first discharging region is between the lower surface of the first electrode and the upper surface of the second electrode. The second discharging region is between the side surface of the protrusion electrode and the opening inner surface of the second electrode. The third discharging region is between the lower surface of the protrusion electrode and the opening inner surface of the second electrode. The fourth discharging region is between the second electrode and the substrate. This segmentation allows selective plasma generation in different regions based on process requirements.
Solution Approach 2:
Different regions are designed with different plasma generation properties to match local processing requirements. The protrusion electrodes create localized discharging regions with higher plasma density near the substrate, while other regions have reduced or no plasma generation. This local quality differentiation reduces radical loss in regions where plasma is not required while maintaining effective processing coverage in regions where it is needed.
2Productivity
If plasma is generated uniformly across all regions, then processing efficiency is improved, but pollution and radical loss occur in regions requiring no plasma
Solution Approach 1:
The processing space is divided into distinct discharging regions with different plasma generation characteristics. The first discharging region is between the lower surface of the first electrode and the upper surface of the second electrode. The second discharging region is between the side surface of the protrusion electrode and the opening inner surface of the second electrode. The third discharging region is between the lower surface of the protrusion electrode and the opening inner surface of the second electrode. The fourth discharging region is between the second electrode and the substrate. This segmentation enables selective plasma generation to avoid pollution in non-required regions.
Solution Approach 2:
Each discharging region is designed with specific plasma generation properties tailored to its processing requirements. The protrusion electrodes create localized high-density plasma regions near the substrate surface, while other regions have reduced plasma generation to minimize pollution. This local quality approach maintains processing efficiency in critical areas while eliminating harmful effects in non-required areas.
3Device complexity
If electrode structure is simplified without protrusion electrodes, then device complexity is reduced, but plasma density and decomposition efficiency decrease
Solution Approach 1:
The protrusion electrodes are positioned in advance to create specific electric field distributions and plasma generation patterns before the actual processing begins. The protrusion electrodes extend from the first electrode toward the second electrode, pre-establishing discharge paths that concentrate plasma in desired regions. This preliminary structural arrangement ensures high plasma density in critical areas without requiring complex real-time control mechanisms.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design enhances processing efficiency by minimizing radical loss and pollution in non-plasma regions, while increasing plasma density and decomposition efficiency in regions where plasma is required.
Implementation Method 1
a first discharging region between a lower surface of the first electrode and an upper surface of the second electrode; a second discharging region between a side surface of the protrusion electrode and an opening inner surface of the second electrode; a third discharging region between a lower surface of the protrusion electrode and the opening inner surface of the second electrode; and a fourth discharging region between the second electrode and the substrate. Plasma may be generated in at least one region of the first to fourth discharging regions.
Data Source
AI summary
The present invention relates to a substrate processing apparatus including: a chamber; a first electrode disposed on the chamber; a second electrode disposed under the first electrode, the second electrode including a plurality of openings; a plurality of protrusion electrodes extending from the first electrode to the plurality of openings of the second electrode; a substrate supporter being opposite to the second electrode and supporting a substrate; a first discharging region between a lower surface of the first electrode and an upper surface of the second electrode; a second discharging region between a side surface of the protrusion electrode and an opening inner surface of the second electrode; a third discharging region between a lower surface of the protrusion electrode and the opening inner surface of the second electrode; and a fourth discharging region between the second electrode and the substrate, wherein plasma is generated in at least one region of the first to fourth discharging regions.