Plasma Chamber Electromagnet Layout for Magnetic Field Control
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Solution Overview
Problem
Existing plasma processing apparatuses face challenges in precise control of magnetic field distribution and heat generation in coils due to mutual interference and heat buildup in electromagnets.
Innovation Solution
Incorporation of a magnetic inductor between coils with adjustable positioning and cooling mechanisms, along with a demagnetization module to manage heat and magnetization effectively.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If multiple annular electromagnets with different radii are disposed spaced apart in a radial direction, then plasma density distribution can be controlled, but large mutual interference occurs between inner and outer coils leading to increased heat generation
Solution Approach 1:
A magnetic inductor is introduced as an intermediary component disposed between the inner coil and outer coil. This magnetic inductor mediates the magnetic field interaction between the coils, reducing mutual interference and consequently decreasing heat generation in the coils while maintaining plasma density control capability
Solution Approach 2:
The electromagnet system is segmented into multiple independent coils (inner coil, outer coil) with a magnetic inductor positioned between them. This segmentation allows independent control of each coil's current, enabling precise plasma density distribution control while reducing mutual interference through the magnetic inductor
2Measurement precision
If current flowing through coils is adjusted to control plasma density distribution, then plasma processing can be performed, but precise control is difficult and independent control of heat generation and plasma density is challenging
Solution Approach 1:
The electromagnet is divided into multiple independent coils (inner coil, outer coil) that can be controlled independently. Each coil can have different current values applied, enabling separate control of magnetic field regions and从而实现 precise plasma density distribution control and independent heat management
Solution Approach 2:
The magnetic inductor acts as a mediator between the inner and outer coils, allowing independent control of magnetic field strength in different regions. This enables precise control of plasma density distribution while independently managing heat generation in each coil region
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances precise control of magnetic field distribution and reduces heat generation in coils, improving plasma processing accuracy and efficiency.
Implementation Method 1
When current is applied to the coil, a magnetic field is formed in the chamber. The density distribution of the plasma generated in the chamber may be controlled by adjusting the intensity or distribution of the magnetic field.
Implementation Method 2
the magnetic inductor may include a plurality of unit magnetic inductors, and each of the plurality of unit magnetic inductors may be formed in an annular shape or a rod shape
Implementation Method 3
a cooling fan configured to supply a cooling gas to an inner space in the housing
Implementation Method 4
The magnetic inductor may have a refrigerant flow path formed therein to allow refrigerant supplied from a refrigerant source to flow therethrough
Data Source
AI summary
Disclosed is a substrate processing apparatus including chamber having defined therein a processing space for a processing of a substrate, a substrate support unit disposed in the chamber, a gas supply unit configured to supply gas to the interior of the chamber, a plasma generation unit including a high-frequency power supply configured to generate plasma in the processing space, an electromagnet unit configured to generate a magnetic field in the processing space, and a controller. The electromagnet unit includes a coil module including a plurality of unit coils and a magnetic inductor disposed between the plurality of unit coils. The substrate processing apparatus suppresses heat generation in the coil module and precisely controls a magnetic field.