Laser Plasma Enclosure Wall Thickness for Aberration Compensation
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Solution Overview
Problem
Laser-sustained plasma illuminator systems face significant optical aberrations due to enclosure shapes and gas refractive indices, leading to irregular plasma shapes and uncontrollable plasma sizes, especially with high numerical aperture systems.
Innovation Solution
Varying the thickness and refractive index of the enclosure walls, potentially using multiple materials, to compensate for optical aberrations, allowing for improved plasma focus and control without modifying the reflector shape for each enclosure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If a high NA laser is used to pump the plasma, then the plasma brightness and efficiency are improved, but optical aberrations from the enclosure and gas refraction increase significantly
Solution Approach 1:
The patent applies local quality by varying the thickness of the enclosure wall at different locations to compensate for optical aberrations. The wall thickness is specifically adjusted in regions where aberrations occur, allowing the system to maintain high NA operation while correcting focus distortion caused by the enclosure and gas refraction.
Solution Approach 2:
The patent changes physical parameters of the enclosure wall, specifically the thickness parameter, to compensate for optical aberrations. By varying the wall thickness parameter across different regions of the enclosure, the system corrects refractive effects while maintaining high NA laser operation for bright plasma generation.
2Shape
If the enclosure shape is modified to compensate for aberrations, then the plasma shape control is improved, but the device complexity and manufacturing difficulty increase
Solution Approach 1:
Instead of modifying the overall enclosure shape, the patent applies local quality by varying the wall thickness at specific locations. This approach maintains a simple, reproducible enclosure geometry while introducing localized thickness variations to correct optical aberrations, thereby preserving ease of manufacture.
Solution Approach 2:
The patent creates a universal enclosure design where a single enclosure shape can be used with multiple reflectors for different plasma configurations. The variable wall thickness provides aberration compensation across different operating conditions, making the enclosure universally applicable without requiring custom shaping for each application.
3Manufacturing precision
If different reflector shapes are used for different enclosure configurations, then the optical aberration compensation is improved, but the device complexity and cost increase
Solution Approach 1:
The patent makes the enclosure universally applicable by incorporating variable wall thickness that compensates for aberrations across different configurations. This allows a single enclosure design to work with multiple reflector types and plasma configurations, eliminating the need for custom reflector designs for each enclosure variant.
Solution Approach 2:
The variable wall thickness of the enclosure acts as an intermediary that compensates for optical aberrations, allowing standard reflectors to function effectively across different enclosure configurations. This intermediary compensation mechanism eliminates the need for complex custom reflector designs.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables more efficient plasma performance and cost-effective operation by focusing light uniformly across various enclosure shapes and pressures, optimizing plasma shape and size, and allowing a single uncompensated reflector to be used across different configurations.
Implementation Method 1
Gas refraction compensation for laser-sustained plasma bulbs... aberrations introduced by an enclosure... the refractive index of the gas inside the enclosure is another source of aberrations... Varying the thickness and refractive index of the enclosure walls... to compensate for optical aberrations
Data Source
AI summary
A laser-sustained plasma illuminator system includes at least one laser light source to provide light. At least one reflector focuses the light from the laser light source at a focal point of the reflector. An enclosure substantially filled with a gas is positioned at or near the focal point of the reflector. The light from the laser light source at least partially sustains a plasma contained in the enclosure. The enclosure has at least one wall with at least one property that is varied to compensate for optical aberrations in the system.