Plasma Etching Simulation Using Pre-stored Base Shapes
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Solution Overview
Problem
Conventional simulation methods for plasma etching processes require recalculating base shapes when parameters change, leading to increased simulation time and costs, which reduces the efficiency of predicting physical quantities such as electric field distributions and damage distributions.
Innovation Solution
An information processing device and method that predicts physical quantities like electric field distributions and perturbation shapes using a base shape storage unit and physical quantity prediction unit, allowing for efficient prediction without the need for recalculating base shapes when processing conditions change, by storing base shapes and using them to predict physical quantities based on processing conditions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional simulation methods recalculate base shapes when parameters change, then prediction accuracy of physical quantities is maintained, but simulation time and costs increase
Solution Approach 1:
The patent pre-calculates and stores base shapes for various processing conditions in a database before actual simulation needs arise. When parameters change during simulation, the system retrieves pre-stored base shapes instead of recalculating them, significantly reducing simulation time while maintaining prediction accuracy through the use of pre-computed accurate geometric foundations.
Solution Approach 2:
The simulation process is divided into two independent segments: base shape calculation and physical quantity prediction. By separating these tasks, the patent allows base shapes to be pre-calculated and stored independently, then reused across multiple simulations without recalculation, thereby reducing redundant computational effort while preserving accuracy.
2Measurement precision
If conventional simulation methods recalculate base shapes when parameters change, then prediction accuracy is maintained, but device development cost rises
Solution Approach 1:
The system performs base shape calculations in advance and stores them in a database, converting one-time computational costs into reusable assets. When parameters change, pre-stored base shapes are retrieved rather than recalculated, reducing both time and cost expenditures while maintaining the accuracy required for reliable device development predictions.
Solution Approach 2:
The patent creates and stores copies of base shapes for various processing conditions in a database. These copied base shapes can be retrieved and reused across multiple simulations without requiring recalculation, thereby reducing computational costs and development expenses while maintaining prediction accuracy through faithful replication of geometric foundations.
3Measurement precision
If base shapes are recalculated for each parameter change, then simulation accuracy is maintained, but prediction efficiency decreases
Solution Approach 1:
Base shapes are pre-calculated and stored in a database before simulation execution. When parameters change, the system retrieves pre-stored base shapes instead of recalculating them, maintaining simulation accuracy through use of pre-computed accurate geometric data while significantly improving prediction efficiency by eliminating redundant calculations.
Solution Approach 2:
The simulation workflow is segmented into base shape preparation (pre-calculated and stored) and physical quantity prediction (executed when needed). This segmentation allows base shapes to be computed once and reused across multiple prediction scenarios, maintaining accuracy while improving overall prediction efficiency by avoiding repeated calculations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly reduces simulation time and costs by allowing for efficient prediction of physical quantities without the need for repeated recalculations of base shapes, enhancing the accuracy and efficiency of plasma etching process simulations.
Implementation Method 1
a physical quantity prediction unit that predicts a physical quantity within the chamber on the basis of a processing condition determined for the sample and associated with the physical quantity and the base shape
Data Source
AI summary
Efficiency of prediction of a physical quantity increases in repeated simulation of an etching process with a change of parameters. An information processing device includes a base shape storage unit and a physical quantity prediction unit. The base shape storage unit of the information processing device stores a shape of a sample etched within a chamber as a base shape. On the other hand, the physical quantity prediction unit of the information processing device predicts a physical quantity within the chamber on the basis of a processing condition determined for the sample and associated with the physical quantity and the base shape.