Plasma Gap Control Plate for Adaptive Substrate Treatment
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Solution Overview
Problem
Existing substrate treating apparatuses using plasma have difficulty in changing the characteristics of the electric field or plasma without altering the positions of the components forming the electric field, limiting flexibility in plasma treatment processes.
Innovation Solution
A substrate treating apparatus with a plasma control unit that includes a gap control plate and a plate driver to adjust the gap between the gap control plate and the support plate, allowing for dynamic changes in plasma characteristics by moving the gap control plate and synchronously moving the support unit, while maintaining a reference gap to optimize plasma treatment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If components forming the electric field are fixedly installed within the apparatus, then the apparatus structure is simple and stable, but it is difficult to change characteristics of the electric field or the plasma
Solution Approach 1:
The patent applies the dynamics principle by making the gap control plate movable rather than fixed. The plate driver moves the gap control plate in the top/down direction, allowing dynamic adjustment of the gap between the gap control plate and support plate. This enables plasma characteristic changes through mechanical movement, resolving the contradiction between adaptability and device complexity.
2Adaptability or versatility
If the gap control plate is moved to change plasma characteristics, then plasma adaptability is improved, but the gap between the gap control plate and support plate may vary causing treatment inconsistency
Solution Approach 1:
The patent implements feedback control through the controller that receives position information from both the plate driver and lift unit, and controls them in a synchronized manner. This feedback mechanism ensures that when the gap control plate moves, the support plate moves correspondingly to maintain a constant reference gap, while still allowing plasma characteristic adjustment through the relative position changes between electrodes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient and flexible changes in plasma characteristics, improving the treatment process by adjusting the gap between electrodes to alter the plasma's physical and chemical properties, enhancing the treatment of substrates according to specific recipes.
Implementation Method 1
A plasma refers to an ionized gas state made of ions, radicals, and electrons, and is produced by very high temperatures, strong electric fields, or high-frequency electromagnetic fields. The plasma control unit is configured to change a characteristic of a plasma formed in the treating space
Implementation Method 2
components forming an electric field have their positions fixed within the apparatus, constantly maintaining a gap with the substrate according to a set recipe. The plate driver changing a position of the gap control plate, and the plate driver maintains a gap between a bottom surface of the gap control plate and a top surface of the support plate while changing a characteristic of the plasma by changing the position of the gap control plate
Data Source
AI summary
The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing having a treating space; a support unit positioned within the treating space and configured to apply a power and to support a substrate; and a plasma control unit configured to change a characteristic of a plasma formed in the treating space, and wherein the plasma control unit includes: a gap control plate positioned above the support unit; and a plate driver changing a position of the gap control plate, and the plate driver maintains a gap between a bottom surface of the gap control plate and a top surface of the support plate while changing a characteristic of the plasma by changing the position of the gap control plate.