Plasma Gas Distribution Plate Radial Circumferential Grooves
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Solution Overview
Problem
The existing gas distribution apparatus in plasma processing equipment is structurally complex and costly, making it difficult to achieve uniform gas distribution across larger workpieces, as it requires multiple layers of flow choking plates to ensure radial uniformity, which increases complexity and manufacturing costs.
Innovation Solution
A gas distribution apparatus with a support plate and a showerhead electrode, featuring a first gas distribution plate with circumferential and radial gas-flow grooves and axial viaholes, allowing process gas to spread uniformly through radial and circumferential grooves, reducing the need for multiple layers and simplifying the structure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple layers of flow choking plates are used to ensure radial uniformity of process gas distribution, then the uniformity of gas distribution is improved, but the device complexity and manufacturing cost increase
Solution Approach 1:
The gas distribution plate is segmented into multiple functional zones: a central gas inlet, radial gas-flow grooves extending from the center, and circumferential gas-flow grooves intersecting the radial grooves. This segmentation creates a grid-like pattern that systematically distributes process gas across the entire plate surface, ensuring uniform radial distribution without requiring multiple stacked layers.
Solution Approach 2:
The invention transitions from a one-dimensional vertical stacking approach (multiple layers of flow choking plates) to a two-dimensional planar distribution approach (radial and circumferential grooves on a single plate). By adding the circumferential dimension to the radial groove pattern, the system achieves comprehensive gas distribution across the plate surface in a single layer, reducing device complexity while maintaining uniformity.
2Manufacturing precision
If multiple layers of flow choking plates are used to ensure radial uniformity of process gas distribution, then the uniformity of gas distribution is improved, but the manufacturing cost increases
Solution Approach 1:
The invention merges the functions of multiple flow choking plates into a single gas distribution plate by integrating radial and circumferential groove systems. This consolidation reduces the number of manufactured components from multiple stacked plates to one monolithic structure, thereby reducing manufacturing costs while achieving the same uniform gas distribution function.
Solution Approach 2:
By transitioning to a two-dimensional groove pattern on a single plate, the invention eliminates the need for costly multi-layer stacking and alignment processes. The radial and circumferential grooves work together in planar space to achieve uniform distribution, simplifying manufacturing and reducing costs.
3Area of moving object
If the overall size of the workpiece increases, then the processing capability is improved, but the area of the reaction chamber cross section increases making uniform gas distribution more difficult to achieve
Solution Approach 1:
The gas distribution plate is segmented into multiple functional zones: a central gas inlet, radial gas-flow grooves extending from the center, and circumferential gas-flow grooves intersecting the radial grooves. This segmentation creates a grid-like pattern that systematically distributes process gas across the entire plate surface, ensuring uniform radial distribution without requiring multiple stacked layers.
Solution Approach 2:
The invention implements local quality by varying the groove dimensions and densities in different regions of the plate. The radial and circumferential grooves can be designed with different widths, depths, and spacing to optimize gas distribution for specific workpiece sizes and shapes, ensuring uniform gas supply across the entire large-area workpiece surface.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design achieves high uniformity of process gas distribution in the reaction chamber with a simpler structure, reducing manufacturing costs and complexity while ensuring consistent gas supply across the workpiece.
Implementation Method 1
a first gas distribution plate is horizontally arranged in a chamber between the support plate and the showerhead electrode, and the first gas distribution plate has a plurality of axial viahole; at least one circumferential gas-flow groove surrounding the central position of the first gas distribution plate and a plurality of radial gas-flow grooves communicating with the at least one circumferential gas-flow groove are arranged on an upper surface of the gas distribution plate; the plurality of axial viahole are arranged in the circumferential gas-flow groove and the plurality of radial gas-flow grooves
Data Source
AI summary
A gas distribution apparatus for a plasma processing equipment is provided. The gas distribution apparatus includes a support plate (3) and a showerhead electrode (5) that are secured together parallelly to define a chamber for gas distribution. A first gas distribution plate (4) is arranged in the chamber horizontally. On an upper surface of the gas distribution plate (4), at least one circumferential gas-flow groove (41) around its axis and a plurality of radial gas-flow grooves (42) communicating with the at least one circumferential gas-flow groove (41) is arranged. A plurality of axial viahole (43) are formed in the at least one circumferential gas-flow groove (41) and the plurality of radial gas-flow grooves (42). The gas distribution apparatus can achieve a uniform gas distribution in the plasma processing equipment.