Plasma Gas Supply Path Layout to Prevent Abnormal Discharge
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Solution Overview
Problem
Existing plasma processing apparatuses experience abnormal discharge due to the design of gas supply paths with bends and branches, which are difficult to manufacture and prone to ion entry, leading to inefficiencies and potential damage.
Innovation Solution
The gas supply paths in the plasma processing apparatus are designed with specific dimensions and orientations to minimize ion entry, featuring a representative length of 0.5 mm or less, a ratio of longest length to representative length of 2 or more, and a thickness of 2 mm or more, ensuring the first end is not visible from the second end in plan view, thus preventing abnormal discharge.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If gas supply paths with bends and branches are provided in electrodes, then gas distribution can be achieved, but abnormal discharge occurs and manufacturing becomes difficult
Solution Approach 1:
The gas supply path is divided into multiple straight segments arranged in series, avoiding continuous bends and branches. Each segment is a straight hole with length 0.5mm or less, and the cumulative path length achieves the required gas distribution while maintaining straight geometry throughout, eliminating abnormal discharge causes.
Solution Approach 2:
The gas supply path utilizes three-dimensional spatial arrangement within the electrode thickness direction. Multiple straight holes are positioned at different depths and lateral positions, creating a complex gas distribution network through vertical and lateral positioning rather than through bends and branches in a single plane.
2Productivity
If gas supply path length is increased to improve gas distribution, then ion entry increases, but if length is decreased, then gas distribution efficiency decreases
Solution Approach 1:
Different regions of the electrode receive gas through optimally positioned straight holes. The gas supply path geometry is locally optimized for each position, with hole lengths and positions tailored to deliver gas efficiently to specific areas while maintaining the constraint that each hole remains 0.5mm or less to prevent ion entry.
3Adaptability or versatility
If complex bent gas supply paths are used, then gas can reach remote areas, but the paths become difficult to manufacture
Solution Approach 1:
The gas supply system uses multiple independent straight hole segments rather than single continuous bent paths. Each straight hole can be manufactured independently using simple drilling or laser processing, and their collective arrangement achieves comprehensive gas coverage without requiring complex path geometry.
Data Source
AI summary
A plasma processing apparatus includes a plasma processing apparatus inner member including a gas supply path and a forming portion in which the gas supply path is formed. The gas supply path has a representative length d1 and a longest length d2 in a cross-section perpendicular to a longitudinal direction of the gas supply path. The representative length d1 is 0.5 mm or less, a ratio d2/d1 of the longest length d2 to the representative length d1 is 2 or more, an other end is not visible from one end in a plan view, and the forming portion has a thickness of 2 mm or more.