Plasma Generation Device Standby Mode Gas Control

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Solution Overview

Problem

Existing plasma generation devices face inefficiencies in plasma processing, particularly in quickly restarting plasma processing after a stop signal is received, leading to wasteful gas consumption and potential deactivation of plasma due to environmental interactions.

Innovation Solution

The plasma generation device employs a control system that continues to supply processing gas and heating gas during a stop signal, allowing for immediate plasma generation upon restarting, with distinct operation modes (normal and standby) to manage gas consumption and prevent plasma deactivation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of energy

If the processing gas supply is stopped when the stop signal is received, then gas consumption is reduced, but plasma processing cannot be restarted immediately

Engineering Contradiction:
Improvegas consumptionVSAvoidrestart time
Core Design Contradiction:
Loss of energyVSLoss of time

Solution Approach 1:

The control unit maintains processing gas supply in the standby mode even after receiving a stop signal, preparing the reaction chamber in advance for immediate plasma generation when the start signal is received again. This preliminary action of keeping gas flowing ensures that plasma processing can resume without delay while managing gas consumption through mode selection.

Inventive Principle:
Principle #10Preliminary action

2Productivity

If the processing gas supply is continued during stop signal, then plasma processing can be restarted immediately, but gas consumption increases

Engineering Contradiction:
Improveplasma processing efficiencyVSAvoidgas consumption
Core Design Contradiction:
ProductivityVSLoss of substance

Solution Approach 1:

The system dynamically adjusts gas supply behavior based on the selected operation mode. In standby mode, gas supply continues during stop signals to enable immediate restart. In normal mode, gas supply stops with the stop signal to reduce consumption. This dynamic adaptation allows the system to optimize between productivity and resource consumption based on operational requirements.

Inventive Principle:
Principle #15Dynamics

3Temperature

If the voltage source is switched off for cooling, then plasma treatment can be cooled down, but plasma generation cannot be performed

Engineering Contradiction:
Improvecooling effectVSAvoidplasma generation capability
Core Design Contradiction:
TemperatureVSProductivity

Solution Approach 1:

The control unit segments the operation into distinct modes (normal mode and standby mode) that separate the cooling function from the plasma generation function. In standby mode, the system maintains gas flow without requiring voltage application, allowing the chamber to be in a ready state for immediate plasma generation without needing to cycle voltage on and off for cooling.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables efficient plasma processing by allowing immediate restart of plasma generation in standby mode and reducing gas consumption in normal mode, while preventing plasma deactivation through heated gas protection.

Implementation Method 1

electric power is supplied to multiple electrodes arranged in the reaction chamber. As a result, electrical discharge occurs in the reaction chamber, and the processing gas is converted into plasma, thereby generating plasma gas

Methodology Applied
Scientific EffectElectrical discharge: Electric Arc

Implementation Method 2

heating-use gas is supplied to the heater during a relatively long time when the stop signal is received

Methodology Applied
Scientific EffectHeating: Heating

Data Source

PatentEP3606293B1Plasma generation device
Publication Date: 2022.09.07 FUJI CORP
  • EP3606293B1 patent drawingFigure 1
  • EP3606293B1 patent drawingFigure 2
  • EP3606293B1 patent drawingFigure 3

AI summary

A plasma generation device including: an electric power supply device configured to supply electric power to multiple electrodes arranged in a reaction chamber; a processing gas supply device configured to supply a processing gas to the reaction chamber; and a control device configured to control operation of the electric power supply device and the processing gas supply device, wherein the control device is configured to control operation of the processing gas supply device and the electric power supply device in either of a first operation mode in which, when a stop signal is received while electric power is being supplied to the electrodes in a state with the processing gas being supplied to the reaction chamber, supply of electric power to the electrodes is stopped and supply of the processing gas to the reaction chamber is stopped, and a second operation mode in which supply of electric power to the electrodes is stopped, but the processing gas continues to be supplied to the reaction chamber.