Plasma Generator Pulse Switching for Multi-Chamber Power Sharing
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Solution Overview
Problem
Current plasma treatment devices with single process chambers and generators are inefficient, as they typically utilize only 10% of available continuous power due to low duty cycles, leading to high operational costs and resource wastage.
Innovation Solution
A plasma generator system that coordinates pulsed electrical power delivery to multiple process chambers, utilizing a control unit to manage power requirements and prevent arcing, allowing simultaneous operation while optimizing power usage and reducing the number of generators needed.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of energy
If a single plasma generator is used for one process chamber with low duty cycle operation, then the process can be maintained reliably, but the power utilization efficiency deteriorates to less than 10%
Solution Approach 1:
The patent combines multiple process chambers into a single vacuum chamber and uses a single plasma generator to serve all chambers. The switching unit dynamically assigns the plasma generator to different chambers based on process requirements, enabling one generator to handle multiple chambers sequentially while maintaining high power utilization efficiency above 50%.
Solution Approach 2:
The system implements periodic switching between different process chambers, where the plasma generator alternates serving different chambers in a cyclic manner. This periodic assignment allows the generator to operate continuously at high power levels while each chamber receives plasma treatment in scheduled intervals, resolving the contradiction between energy efficiency and operational throughput.
2Productivity
If multiple plasma generators are used for multiple process chambers, then each chamber can be operated simultaneously with high productivity, but the device complexity and cost increase
Solution Approach 1:
The single plasma generator is designed with multi-functionality to serve multiple process chambers through the switching unit. The generator can be dynamically assigned to different chambers based on process requirements, making one generator perform the function of multiple generators would otherwise be needed, thereby reducing device complexity while maintaining productivity.
Solution Approach 2:
The switching unit acts as an intermediary between the single plasma generator and multiple process chambers. It manages the power distribution and timing signals to coordinate plasma generation across different chambers, enabling one generator to effectively control multiple chambers without requiring multiple independent generator systems.
3Productivity
If the plasma generator operates continuously at high power, then productivity increases, but the risk of arcing and process instability increases
Solution Approach 1:
The system uses periodic pulsed operation instead of continuous high-power operation. The plasma generator delivers power in controlled pulses to each chamber in sequence, maintaining high average power output for productivity while the intermittent nature of pulsing allows plasma conditions to stabilize between pulses, reducing arc formation and improving process reliability.
Solution Approach 2:
The control unit monitors plasma conditions in each chamber and uses feedback signals to adjust the timing and duration of plasma generation. This feedback mechanism ensures that plasma is generated only when conditions are optimal, preventing arcing and maintaining process stability while still achieving high productivity through efficient use of the single generator.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution significantly increases the efficiency of plasma generators, reduces operational costs, and allows for flexible power distribution across multiple process chambers, enhancing the utilization of available power resources.
Implementation Method 1
a switching unit (12) having a input connected to the output of the power supply (10) and having at least two switching unit outputs for respective connection to one of the at least two process chambers (3a, 3b), wherein the switching unit (12) is configured to form from a direct current at the input an alternating current having a predetermined frequency of at least 40 KHz as an output signal
Implementation Method 2
An electrical power having a frequency of at least 40 KHz is then applied to the wafer boats in order to generate a plasma from a suitable process gas between the plates and between the wafers accommodated on the plates
Data Source
AI summary
A plasma generator and a method for the pulsed provision of electrical power having a frequency of at least 40 KHz to at least two process chambers are described. The plasma generator comprises: a control unit configured to obtain and evaluate process data about processes in the at least two process chambers; a controllable power supply having an output, the controllable power supply being configured to output a direct current at a predetermined voltage and/or intensity at its output in response to a control signal from the control unit; and a switching unit having a first input connected to the output of the power supply and having at least two switching unit outputs for respective connection to one of the at least two process chambers. The switching unit is configured to form, from a direct current at the input, an alternating current having a predetermined frequency of at least 40 KHz as an output signal and to selectively output the output signal as a pulse for a predetermined pulse duration to one of the switching unit outputs in response to a control signal from the control unit. The control unit is configured to coordinate power requirements of the at least two process chambers and to drive the power supply and the switching unit such that at the respective switching unit outputs communicating with the process chambers, substantially the power corresponding to the power requirements is provided as pulses over a period of time, wherein the pulses of the respective process chambers are temporally offset from each other such that the process chambers can be operated simultaneously.