Plasma Generator With Variable Short-Circuit for Uniform Distribution
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Solution Overview
Problem
Existing plasma generators produce non-uniform plasma distributions due to microwave intensity reduction as microwaves propagate, leading to inadequate surface treatment quality.
Innovation Solution
A plasma generator design with a waveguide and propagation chamber configuration that includes a power-driven variable short-circuit and a passage region with increasing width to compensate for microwave attenuation, ensuring uniform plasma generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If microwaves are propagated from the waveguide outlet to the plasma generating chamber, then plasma is generated, but microwave intensity reduces and plasma distribution becomes non-uniform
Solution Approach 1:
The patent applies local quality by making the openings non-uniform in distribution. Specifically, the openings have different sizes, shapes, and/or orientations at different locations within the waveguide outlet. This allows the microwave energy to be distributed more evenly across the plasma generating chamber, compensating for the natural attenuation of microwave intensity during propagation and achieving uniform plasma distribution throughout the chamber.
Solution Approach 2:
The patent changes the parameters of the openings (size, shape, orientation, distribution density) to optimize plasma uniformity. By varying these geometric parameters across different locations in the waveguide outlet, the system compensates for the exponential decay of microwave intensity with distance, ensuring consistent plasma generation from the near field to the far field of the waveguide outlet.
2Volume of moving object
If the propagation chamber size is reduced to decrease bulkiness, then device size is reduced, but plasma generation capability may be compromised
Solution Approach 1:
The patent optimizes the geometric parameters of the openings (size, shape, orientation) to maximize plasma generation efficiency within a compact volume. By carefully designing these parameters, the system achieves uniform plasma distribution and adequate ionized gas production without requiring a large propagation chamber, thus reducing overall device bulkiness while maintaining performance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The design achieves spatially homogeneous plasma clouds with improved efficiency and flexibility, maintaining ionized gas quality and quantity, and is adaptable to various plasma types and frequency variations.
Implementation Method 1
a waveguide enables propagation of the microwaves from a generator to a propagation chamber
Implementation Method 2
surface working operations of objects and materials can be performed through use of plasma, i.e. a gas on which striking of a suitable electromagnetic radiation has been caused, so as to ionise the gas itself
Data Source
AI summary
A plasma generator comprising a propagation chamber propagating an electromagnetic radiation, and a plasma-generating chamber associated with the propagation chamber; said propagation chamber has a passage region of increasing width on moving away from the entrance region for insertion of the electromagnetic radiation into the propagation chamber. The passage region enables an at least partial passage of the electromagnetic radiation towards the plasma-generating chamber.