Plasma Generator Waveguide Stubs for Uniform Irradiation
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Solution Overview
Problem
Existing plasma processing apparatuses lack the capability to uniformly irradiate multiple works or large-area works with plasma, particularly when using multiple plasma generation nozzles, as they struggle to maintain uniformity in plasma application across varied shapes and large surfaces.
Innovation Solution
A plasma generation device comprising a waveguide with multiple plasma generation nozzles and stubs to control microwave energy distribution, allowing for uniform plasma irradiation, where the waveguide propagates microwaves to excite processing gases into plasma, and the stubs adjust microwave energy intake by each nozzle to ensure consistent plasma plume size and shape.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple plasma generation nozzles are used to process large-area works or multiple works simultaneously, then processing efficiency is improved, but uniformity of plasma application deteriorates
Solution Approach 1:
The waveguide is divided into multiple independent plasma generation nozzles, each capable of generating plasma separately. This segmentation allows each nozzle to be independently controlled and optimized, enabling simultaneous processing of multiple works or large-area works while maintaining uniform plasma application across all processing zones.
Solution Approach 2:
Stub units are installed at specific locations around each nozzle to locally adjust the microwave energy distribution. This local quality adjustment ensures that each nozzle receives the appropriate amount of microwave energy, maintaining consistent plasma characteristics across all nozzles despite variations in their positions within the waveguide, thereby achieving uniform plasma application across multiple or large-area works.
2Area of stationary object
If multiple plasma generation nozzles are arranged in the waveguide, then the processing area is expanded, but control of plasma uniformity becomes more difficult
Solution Approach 1:
Stub units are strategically positioned around each nozzle to provide localized microwave energy adjustment. This allows independent control of each nozzle's plasma generation, making it easier to maintain uniform plasma characteristics across multiple nozzles and expanding the effective processing area while simplifying uniformity control.
Solution Approach 2:
The stub units can be adjusted to dynamically control the microwave energy distribution to each nozzle. This dynamic adjustment capability enables easy control of plasma uniformity across multiple nozzles, allowing the system to adapt to different processing requirements and maintain consistent plasma quality throughout the expanded processing area.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables uniform plasma processing across multiple or large-area works, enhancing processing efficiency and ensuring consistent surface treatment by adjusting energy distribution to each nozzle, thereby improving the uniformity and effectiveness of plasma application.
Implementation Method 1
a waveguide for propagating a microwave therethrough
Implementation Method 2
a plurality of plasma generation nozzles secured to the waveguide and operative to receive processing gas and excite the processing gas into plasma using the microwave
Implementation Method 3
a plurality of stubs secured to the waveguide, one or more of the stubs being disposed around a corresponding one of the nozzles and operative to control an amount of microwave taken by the corresponding nozzle
Data Source
AI summary
A plasma generator is provided which includes: a microwave generation portion which generates a microwave; a wave guide for propagating the microwave; a plurality of plasma generation nozzles which are attached to the wave guide so as to be apart from each other in the direction where the microwave is propagated, receive the microwave, and generate and emit a plasmatic gas based on the energy of this microwave; and a plurality of stabs which correspond to a part or the whole part of the plasma generation nozzles and are each disposed in the wave guide so as to lie in a rear position a predetermined distance apart from each other in the direction where the microwave is propagated.